Showing 661 - 680 results of 1,856 for search '"photoresist"', query time: 0.34s Refine Results
  1. 661
    by 黃柏翰
    Published 2014
    ... lithography. Enhanced fluorescence and Raman are observed on gold deposited-nanocolumns without photoresist...
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  2. 662
  3. 663
    by Chiu-Ling Lung, 龍秋翎
    Published 2014
    ... of coating color photoresist to form black matrix, the etching liquid Ferric chloride (FeCl3) will penetrate...
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  4. 664
    by Wen-Cheng Chang, 張文政
    Published 2018
    ...), that could effectively prepared negative-type photoresist patterns after developing in 1 wt % Na2CO3 (aq...
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  5. 665
    by Ho, Ching-Lin, 何青林
    Published 2018
    ... the wafer surface, lithography process, etching process, photoresist removal and pattern measurement...
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  6. 666
    by CHEN, YU-SHAO, 陳昱劭
    Published 2018
    ... on the electromagnetic resonance of electrowetting-on-dielectric (EWOD) devices with metamaterials. Photoresist...
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  7. 667
    ... the adhesion effect of photoresist and PDMS surface. The MEMS monopole flexible antennas fed by CPW were...
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  8. 668
    by Chun-Cheng Hsu, 徐俊成
    Published 2002
    ...). These data could help the process engineer to prevent the contamination. If the photoresist...
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  9. 669
    by Weng Wen-Ching, 翁文慶
    Published 2003
    ... the lithography condition, include the dosage of electron beam(about 10~12 µC/cm2), the choice of photoresist(NEB...
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  10. 670
    by Tsung-HoYang, 楊琮賀
    Published 2013
    ... which has been deposited the silver layer and coated photoresist. Afterwards, the photoresist was etched...
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  11. 671
    by Guo-Yuan Zeng, 曾國原
    Published 2005
    ... photoresist layers, several different metals (Au, Cr) and thermoelectric materials (Bi2Te3, Sb2Te3...
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  12. 672
    by Pei-Pei Ding, 陳佩佩
    Published 2003
    ...博士 === 國立臺灣大學 === 機械工程學研究所 === 91 === Thick photoresist layer patterning performed by using UV...
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  13. 673
    by Cheng-Chih Hsueh, 薛丞智
    Published 2007
    ... , the thermal reflow technique was adopted to fabricate the semi-cylindrical photoresist master; the PLGA...
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  14. 674
    by Xiang Fang, 方向
    Published 2015
    ... the hole diameter of photoresist pattern down to smaller than 100 nm. And the mechanical strength...
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  15. 675
    by LEE JUIFEN, 李瑞芬
    Published 2000
    ... such as GaAs etch rate, photoresist etch rate, etch selectivity between GaAs and photoresist, and cross-section...
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  16. 676
    by Shinn-Yu Chen, 陳信宇
    Published 2006
    ... probe without coating photoresist; electroplating Cu layer on an AFM probe with an open area on tip...
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  17. 677
    by Jo-Tzu Peng, 彭若慈
    Published 2002
    ... on the multilevel interconnects technology. In the present IC manufacturing processes, photoresist stripping...
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  18. 678
    by 張庭瑋
    Published 2003
    ... by two-photon photopolymerization in photoresists can be transferred into semiconductor materials...
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  19. 679
    by Huang-Shao Ko, 柯皇卲
    Published 2003
    ... is made of photoresists (S1818) so that the cost of metal decomposition can be saved and the potential...
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  20. 680
    by Mehrotra, Prateek
    Published 2012
    ... imaging. However its primary limitation is that the image exponentially decays within the photoresist due...
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