Suggested Topics within your search.
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Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
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Fabrication
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Feature sizes
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Figure of merit
1
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661by 黃柏翰“... lithography. Enhanced fluorescence and Raman are observed on gold deposited-nanocolumns without photoresist...”
Published 2014
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663“... of coating color photoresist to form black matrix, the etching liquid Ferric chloride (FeCl3) will penetrate...”
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664“...), that could effectively prepared negative-type photoresist patterns after developing in 1 wt % Na2CO3 (aq...”
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665“... the wafer surface, lithography process, etching process, photoresist removal and pattern measurement...”
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666“... on the electromagnetic resonance of electrowetting-on-dielectric (EWOD) devices with metamaterials. Photoresist...”
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667by Xu Yongqing, Zhang Binzhen, Duan Junping, Xiao Hong, Lin Xuechen, Huang Chengyuan“... the adhesion effect of photoresist and PDMS surface. The MEMS monopole flexible antennas fed by CPW were...”
Published 2018-11-01
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668“...). These data could help the process engineer to prevent the contamination. If the photoresist...”
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669“... the lithography condition, include the dosage of electron beam(about 10~12 µC/cm2), the choice of photoresist(NEB...”
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670“... which has been deposited the silver layer and coated photoresist. Afterwards, the photoresist was etched...”
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671“... photoresist layers, several different metals (Au, Cr) and thermoelectric materials (Bi2Te3, Sb2Te3...”
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672“...博士 === 國立臺灣大學 === 機械工程學研究所 === 91 === Thick photoresist layer patterning performed by using UV...”
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673“... , the thermal reflow technique was adopted to fabricate the semi-cylindrical photoresist master; the PLGA...”
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674“... the hole diameter of photoresist pattern down to smaller than 100 nm. And the mechanical strength...”
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675“... such as GaAs etch rate, photoresist etch rate, etch selectivity between GaAs and photoresist, and cross-section...”
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676“... probe without coating photoresist; electroplating Cu layer on an AFM probe with an open area on tip...”
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677“... on the multilevel interconnects technology. In the present IC manufacturing processes, photoresist stripping...”
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678by 張庭瑋“... by two-photon photopolymerization in photoresists can be transferred into semiconductor materials...”
Published 2003
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679“... is made of photoresists (S1818) so that the cost of metal decomposition can be saved and the potential...”
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680by Mehrotra, Prateek“... imaging. However its primary limitation is that the image exponentially decays within the photoresist due...”
Published 2012
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