Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
-
641by Harutaka Mekaru“...In combination with tapered-trench-etching of Si and SU-8 photoresist, a grayscale mask for deep X...”
Published 2015-02-01
Get full text
Article -
642by Seung-Hyun Park, Jung-Ah Shin, Hyun-Hee Park, Gwang Yong Yi, Kwang-Jae Chung, Hae-Dong Park, Kab-Bae Kim, In-Seop Lee“..., was identified through a thermal decomposition experiment performed on a photoresist. The VOC concentration...”
Published 2011-09-01
Get full text
Article -
643“..., and investigating its stress, (3) spinning characteristics when spin photoresist, (4) exposure condition...”
Get full text
Others -
644“...), the choice of photoresist (NEB22A or PMMA, the thickness of photoresist) and Proximity effect. Next, about...”
Get full text
Others -
645“... or an argon laser into a negative SU8 or a positive AZ photopolymerizable photoresist is used to pattern...”
Get full text
Others -
646“... mask technique. First, we simulated the exposed dosage distribution over a photoresist by using DoseSim...”
Get full text
Others -
647by Yan-Shen Li, 李炎燊“... plating , photoresist laminating , and machining process include drilling ,tin-lead alloy removal ,etching...”
Get full text
Others -
648“... the photoresist melting and soft lithography techniques to fabricate microvessel scaffolds with circular...”
Get full text
Others -
649“... process, we observed nonuniform negative photoresist spreading due to large mesa height. That caused...”
Get full text
Others -
650“... the PMMA polymer was selected to be the substrate, the negative photoresist JSR was employed to form...”
Get full text
Others -
651“... spots, one can achieve arbitrary photoresist patterns on the roller mold surface. Finally, the surface...”
Get full text
Others -
652“...-electromechanical system (MEMS) with fiber etching processes and SU-8 3050 photoresist of production long-period...”
Get full text
Others -
653by Kawai, Hiroyo“... that the primary cause of sidewall roughness is due to the transfer of roughness on the photoresist and anti...”
Published 2008
Get full text
Others -
654by Chia-Hung Hou, 侯佳宏“... grown on sapphire substrate. The patterns of the microlenses are first formed on the photoresist...”
Get full text
Others -
655“...-8 photoresist and its mass including rotor is 0.047g. The micro motor is an 8/6 axial reluctance...”
Get full text
Others -
656“... of 2μm, and sidewall of 10μm. The SU-8 photoresist is used to fabricated sidewall structures...”
Get full text
Others -
657“... of SU-8 photoresist is increased with the increasing of the width of the beams, but no significant...”
Get full text
Others -
658“..., carbon nanotube film, black photoresist are examined by experiments. The experimental results show...”
Get full text
Others -
659“... of the first layer of SU-8 thick photoresist was studied experimentally. The 5 μm line-width compensation...”
Get full text
Article -
660“... process where the master mold is first formed on a negative tone photoresist and subsequently transferred...”
Get full text
Others