Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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601“... to fabricate the semi-cylindrical photoresist master mold. A PDMS solution was then used in a casting process...”
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602“... experiments and simulations are employed to study radiative properties. For experiments, the photoresist...”
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603“... as a binder resin in photoresist composition. From exposure characteristic curves, the optimal...”
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604“... processing, photoresist stripping is commonly implemented with O2 plasma ashing and wet stripper solution...”
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605“.... In the second part, photoresist-related charging damage was explored in the down...”
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606“... and roughness has been discussed and investigated. The experiment steps have: 1. expose the photoresist...”
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607“...). In this paper, we choose five transparent film (ITO, SiO2, Polyimide, Photoresist 1, Photoresist 2) as the ITO...”
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608“... on the photoresist sidewall inclination and also its dimension are investigated. The photoresist microstructure...”
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609“... the lithography processes, one can make fine photoresist structure on the silicon substrate. Based...”
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610“... to the sudden delay caused by photoresist boiling, the use of VCD pin to improve the credit resistance...”
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611“... pattern was made on photoresist by using conventional g-line optical lithography. Then, thermal reflow...”
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612“...-cut. Next, the polarization reversal electrode of gradient fan-shaped used in photoresist strip...”
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613
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614“... of arsenic-ion implanted beam density on defect evolution in photoresist and polysilicon film also have been...”
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615“..., we can get a Fresnel type electrode. Then we’ll fill in the electrode with SU-8 photoresist...”
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616“... the MEMS smoothly proceed without damaging the photoresist and improve the flatness of the photoresist...”
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617by Lingpeng Liu, Lei Sun, Liping Qi, Ran Guo, Kehong Li, Zhifu Yin, Dongjiang Wu, Helin Zou“.... The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect...”
Published 2020-04-01
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618“... of the exposure process is built, and the 3D light intensity distribution in the photoresist is calculated based...”
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619“... that made of any other photoresists. There has been a great deal of efforts in developing innovative...”
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620“... milling for 8 h. Photoresist and powders of NdFeB and Fe have been mixed at various powder-to-resist...”
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