Showing 581 - 600 results of 1,856 for search '"photoresist"', query time: 0.73s Refine Results
  1. 581
    by Che-Ping Lin, 林哲平
    Published 2004
    ... mask and photoresist ranged from 240μm to 840μm. The fabricating process could be improved. Besides, a...
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  2. 582
    by Ho-Chi Yang, 楊賀琪
    Published 2011
    ... galvanoformung abformung) was produced using THB-126N negative photoresist and AZ-4620 positive photoresist...
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  3. 583
    by Chia-Hung Hung, 洪嘉鴻
    Published 2006
    ...碩士 === 國立清華大學 === 動力機械工程學系 === 94 === SU-8 thick film photoresist is one of the useful materials...
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  4. 584
    by Lee, Cheng-Chang, 李政璋
    Published 2003
    ... materials of MEMS are proposed. One is to combine spin-on photoresist and one-step RIE, and the other...
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  5. 585
    by Tien-Ling Hsieh, 謝典霖
    Published 1999
    ... the device high frequency performance, a detailed tri-layer photoresist T-gate fabrication process...
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  6. 586
    by C. T. Chen, 陳家泰
    Published 1999
    ... of these materials could be used as the substrate. Specific geometrical photoresist patterns are created...
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  7. 587
    by Jun-Da Lin, 林君達
    Published 2006
    ... photoresist to coat on the silicon wafer, and then uses the UV light to expose the pattern on the surface...
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  8. 588
    by Ming-Tsung Lin, 林明宗
    Published 2003
    ...: Firstly, control the heating time and temperature moreover using the JSR THB-430N Negative photoresist had...
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  9. 589
    by 張傑翔
    Published 2010
    ... the Polydimethylsiloxane (PDMS) and the negative photoresist SU8 which is fabricated as a flexible substrate in antenna...
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  10. 590
    by Qing-Song Zhu, 祝慶松
    Published 2016
    ..., we used electron-beam lithography to fabricate the sub-wavelength photoresist grating on a 〖Ta〗_2 O_5...
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  11. 591
    ... the solubility of photoresist, the required electric field intensity to create the desired pattern should...
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  12. 592
    by Yu-HsiangTseng, 曾宇祥
    Published 2018
    ... piezoelectric layer under the photoresist was unexpectedly etched away. The solution is to perform the etching...
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  13. 593
    ... element process and preparation, we use the metal mask and the photoresist to define the micro...
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  14. 594
    ... techniques, and then were using implanted photoresist mask method and etching photoresist mask method...
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  15. 595
    ... particles, a novel water-based photoresist with high ceramic loading of extremely well dispersed ceramic...
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  16. 596
    by Huan Tong, Yueqi Xu, Yingwen Su, Xiangxian Wang
    Published 2019-09-01
    ... and the waveguide layer is a 9650-nm-thick photoresist that can support many guided modes by virtue of its thickness...
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  17. 597
    ... is presented. Upon photoresist baking, compressive stress is induced in the graphene which disappears after...
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  18. 598
    ... on OLED panels can be achieved using a black photoresist, the patterning of black matrix (BM) on top...
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  19. 599
    by Chen, Yuan-Chung, 陳淵崇
    Published 1998
    ... lithography process to coat a layer of photoresist pattern on (100) wafer. Then a 6μm Zirconia...
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  20. 600
    by 許育群
    Published 2003
    ... sample injection and separation have been fabricated on glass chip using negative photoresist and direct...
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