Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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561by 石志鴻“... characteristics of chemical amplified positive photoresists comprising various copolymers were investigated...”
Published 2000
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562“... layer of parylene C on the substrate wafer. Then, we use the photoresist AZ4620 as the sacrificial layer...”
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563by Shao-Chi Wang, 王少棋“...碩士 === 國立高雄應用科技大學 === 電子工程系 === 100 === Dry photoresist stripping process as dry etching process...”
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564“... pattern of the positive photoresist: FEA is fabricated by the E-beam lithography, reactive ion etching...”
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565“..., then employed photolithography to build figure of photoresist, using the photoresist as barrier mask for wet...”
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566“... polymerization platform via utilization of the photoresist to fabricate two-dimensional or three-dimensional...”
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567“.... In this thesis, we use Shipley S1818 positive photoresist to be materials in our experiment. According...”
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568“..., and its main critical process photoresist coaters in color photoresist coated color measure caused...”
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569“...碩士 === 國立中山大學 === 機械與機電工程學系研究所 === 95 === This research presents grating photoresist structures...”
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570by Yeung Ka-Wai, Dong Yuqing, Chen Ling, Tang Chak-Yin, Law Wing-Cheung, Tsui Gary Chi-Pong, Engstrøm Daniel S.“... photoresists, it is challenging to fabricate true 3D LCE micro-structures. In this paper, we...”
Published 2020-05-01
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571“... model of positive photoresist AZ4620 by optical software, respectively. In order to discuss the energy...”
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572“... turns them into gases to escape the photoresist, increasing the free volume of the photoresist...”
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573“... photoresist (EPG510, Everlight) by 351 nm Ar+ laser interference lithography exposure and is transferred to a...”
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574by DeGenova, John.“... processes. Photolithography is a primary semiconductor process where organic photoresist is removed from...”
Published 2001
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575by Richardson, Elliot J. W.“..., have been used to pattern organic molecules, photoresists, and conductive inks to create optically...”
Published 2016
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576“... of photoresist for the thin-film transistor array and color filter took place, typically yellow light is employed...”
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577“... of microscope and observe the pattern that form DLP（Digital Light Processing）project on the photoresist...”
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578“...-line sub-micron positive photoresist film.A 20nm nickel thin film was then sputtered on the photoresist...”
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579by Jackson, Seth A“... wavelength features in photoresist via electromagnetic energy scattered by complicated photomask designs...”
Published 2011
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580“... exposure and film mask on SU-8 photoresist. The result shows that the thickness of the micro-channel is 150...”
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