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Photoresists
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541“... is based on the thermal cracking of pre-pattern photoresist induced by immersing the sample into liquid...”
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542“... to produce an off-step structure in photoresist. Then the photoresist structure can be produced...”
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543“... technique for fabricating off-axis photoresist structure. Through thermal-reflow process, the structure...”
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544“.... After the lithography process, the photoresist and others contamination removing is also very important...”
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545“... lithography and hot-melt method by using JSR-126 and AZ-4620 photoresists to produce dual-layered microlens...”
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546by Mohammadkhani, Ali“... of high precision nanopatterns on a photoresist surface was studied using the inherent potential...”
Published 2013
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547“... contains one KMPR 1025 photoresist layer. Unfortunately, it is proven difficult to completely remove...”
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548“... process. (1) A regular hexagonal micropattern of a photoresist/ZnO stack was fabricated by UV lithography...”
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549by Apratim Majumder, Xiaowen Wan, Farhana Masid, Benjamin J. Pollock, Trisha L. Andrew, Olivier Soppera, Rajesh Menon“... is placed on top of the photoresist layer. The long wavelength photons render the photochromic layer opaque...”
Published 2016-06-01
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550“... by nickel electroforming on electroless Ni-P thin film plated on polymer (photoresist Shipley S1818)/Silicon...”
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551“.... Additionally, we used the linear photoresist-modified wafers fabricated by lithography to form the silane SAM...”
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552“.... This FSG has selective deposition characteristics i.e., it won't deposit on photoresist. Therefore, prior...”
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553“... capacitance and address the RC delay problem. This paper discussed the plasma etching process, photoresist...”
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554“... technology, photoresist lithography and electroforming technology. This method enables the production of 50μm...”
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555by Chen, Ta-Tung“...-traditional machining process involving photoresist processing and electrolytic etching which has received...”
Published 2016
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556“... method. Secondly, a photoresist was used to form a surface Bragg grating on the core surface in terms...”
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557“... to spin coating and expose the positive photoresist on core of fiber with short periodic Bragg surface...”
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558“... (BEF) fabrication using proximity printing with two different photoresists: JSR and AZP4620 whose...”
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559“... the nanotube and the novolac-based photoresist, and a cleaning bake at 300C effectively removes residues...”
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560“...) are electrophoretically deposited onto silicon substrates to form dense structures defined by photoresist molds...”
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