Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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521“... micro optical pickup head system. By integrating thick-film photoresist process, front- and back...”
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522“... confirmed that the p-type conductivity. In the second phase, a photoresist was coating on the previously...”
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523“... for preparing polyaniline in a water medium within a flexible dry-film-photoresist-based polymeric microreactor...”
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524“..., typically by photoresist process, exposure apparatus, and mask technology in three directions. In a...”
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525“...nm after ATRP. Additionally, we used the linear photoresist-modified wafers fabricated by lithography...”
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526by Chen, Ta-Tung“...-traditional machining process involving photoresist processing and electrolytic etching which has received...”
Published 1999
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527
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528by Chomnawang, Nimit“... through voids in thick SU-8 photoresist molds and EAGLE2100 conformal photoresist molds on sacrificial...”
Published 2002
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529“... transfer the pattern on the mask onto the photoresist layer. The vast majority of literatures...”
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530by Mahorowala, Arpan P. (Arpan Pravin), 1970-“... on photoresist masked and silicon oxide-masked polysilicon samples using C12 and HBr chemistries varying...”
Published 2010
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531“... content and the photoresist surface during dry etching influence the result. A high electroforming rate...”
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532by Tommi Kaplas, Antti Matikainen, Tarmo Nuutinen, Sari Suvanto, Pasi Vahimaa, Yuri Svirko“... sacrificial Ni catalyst layer, which significantly increases the crystallinity of the photoresist pyrolyzed...”
Published 2017-08-01
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533“...Abstract Different thicknesses of photoresist layers were deposited on the Ti foil in order...”
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534“..., a photoresist layer constitutes both an adhesion layer and side walls of 50 μm microfluidic channels...”
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535“... solutions. Masking materials, including Cr/Au, PLA-900 position photoresist, and NPR-2500F negative...”
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536“... to spread the compound of photoresist on the surface of wafer evenly. The speed of Spincoating...”
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537“... is fabricated by electroplating with KMPR and SU-8 photoresists molds, and the SU-8 photoresist is used...”
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538“... polarization measurements in 0.5M H2SO4 electrolyte. The micro-patterned photoresist template was used...”
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539by CHIH-YUAH TSAI, 蔡智原“... the spacer but also coating a photoresist layer for controlling the liquid crystal thickness and getting...”
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540“.... In the etching process, the GST film was covered with a patterned photoresist layer as an etching mask, followed...”
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