Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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481“... the photoresist area、polymer surface or ITO surface. The surface of the red、green、blue photoresist or alignment...”
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482“... on the substrate by plasma-enhanced chemical vapor deposition (PECVD), then photoresist was spun on the SiO2...”
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483“... and have its end cut smooth and even, and then carefully attach a small amount of photoresist to the end...”
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484“... in this thesis. We find the remained photoresist on top of the tip is gradually reduced with increasing...”
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485“... fiber grating (SLPFG) is fabricated with SU-8 photoresist by etching and lithography process...”
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486“... of the imprinting pressure is enhanced. The photoresist is coated onto the PDMS mold roller surface by PVA...”
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487“...-interference phase mask is described. The grating pattern is formed into I line positive photoresist (EPG510...”
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488“..., photoresist reflow process, Ni electroplating and hot embossing technique. After photoresist triangular column...”
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489“... and electroless nickel plating. First of all, the photoresist is coated onto the roller surface using three...”
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490“...碩士 === 國立交通大學 === 電子工程系 === 87 === Selective deposition against photoresist for liquid...”
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491“... structure on an i-line sub-micron positive photoresist film.A 20nm nickel thin film was then sputtered...”
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492“... structure on an i-line sub-micron positive photoresist. A 200nm nickel thin film was then sputtered onto...”
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493“... of silicon, thin photoresist of SHIPLEY and Lift-off fabrication technology are used. In the KOH etching...”
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494“... of photoresist. When the photoresist coating thickness is higher, the bottom corner will be more close to predict. ...”
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495by Maltez, Rogério Luis“.... === In the present work we have implanted Sb, Sn and Ag in the photoresist AZ1350 and used the Rutherford...”
Published 2016
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496by Maltez, Rogério Luis“.... === In the present work we have implanted Sb, Sn and Ag in the photoresist AZ1350 and used the Rutherford...”
Published 2016
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497by Maltez, Rogério Luis“.... === In the present work we have implanted Sb, Sn and Ag in the photoresist AZ1350 and used the Rutherford...”
Published 2016
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498“... the fabrication process of micro LED, photoresist coating was employed to fill the 6-μm-deep trench. Using the two...”
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499“...博士 === 國立高雄應用科技大學 === 機械與精密工程研究所 === 102 === The thesis is about using thick photoresist stacking...”
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500“... the interference patterns into photoresist, heat treatment of thin films and magnetization of the dot arrays...”
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