Showing 421 - 440 results of 1,856 for search '"photoresist"', query time: 0.49s Refine Results
  1. 421
    by Zhang, Bangwei
    Published 2009
    ... in microchannels. The microfluidic device is fabricated using a SU8-50 negative photoresist that is exposed...
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  2. 422
    by Yi-Ning Wu, 吳宜寧
    Published 2005
    ... lithography system with high resolution. This system can write pattern directly on the photoresist without...
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  3. 423
    by Ming-Chang Jung, 鍾明昌
    Published 2004
    ... instruments have been used to observe morphologies of the photoresist plates before and after thermal reflow...
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  4. 424
    by Yen-Ting Tu, 杜彥廷
    Published 2015
    ... through lithography process and calculated the volume of the column and sphere on the upper photoresist...
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  5. 425
    by Jun Ying Tan, Gyuhyeong Goh, Jungkwun Kim
    Published 2020-03-01
    ... negative photoresist, a state of partial development of the photoresist is achieved, called the timed...
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    Article
  6. 426
    by Yu-Chung Chang, Bo-Han Huang, Tsung-Hsien Lin
    Published 2020-04-01
    ... reproducibility using electron beam (E-beam) lithography without the problematic photoresist (PR) lift-off process...
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    Article
  7. 427
    by Shih-TsungTsai, 蔡適聰
    Published 2012
    .... There are two types of sandwiched device: Glass-PDMS-Glass or Glass-Photoresist- Glass, and they use PDMS film...
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  8. 428
    by Jung-Chiang Liao, 廖容瑲
    Published 2009
    ... the traditional mechanical extra work or injection molding optical component. The thick-film negative photoresist...
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  9. 429
    by Huang Fawei, 黃發威
    Published 2002
    ... industry to form thin uniform films of photoresist, spin-on-glass, polyimide, and low dielectric constant...
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  10. 430
    by Tai-Te Chiu, 邱泰德
    Published 2010
    ... to increase competitiveness and occupying a place. In order to achieve uniform photoresist coating...
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  11. 431
    by 陳家祥
    Published 2014
    .... By using the processes of bulk micromachining, wafers bonding and photoresist spin coating and heating...
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  12. 432
    by Shi-Sxiang Chan, 詹世祥
    Published 2002
    ... and development time which effect the coating photoresist characters. This study does the further researches...
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  13. 433
    by Lyau, Jia-Bo, 廖嘉柏
    Published 2018
    .... The device integrate both photoresist and ITO glass substrate, such that electrical stimulation can also...
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  14. 434
    by Bau-Jang Lai, 賴保彰
    Published 2005
    ... of the cantilever beam after manufacturing. Hence, only the cantilever beams of SU-8 photoresist or silicon oxide...
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  15. 435
    ... exposure on a photoresist, a gold-based X-ray mask was prepared with conventional UV photolithography...
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  16. 436
    by Su, Jwinn-Lein, 蘇俊聯
    Published 1996
    ... ℃ ). A unique property of selectivity deposition against photoresist has been found...
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  17. 437
    by Hung-Lin Huang, 黃宏琳
    Published 2006
    ... mins). The method of melting photoresist is simple and easy to manufacture. In this experiment, we...
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  18. 438
    by LIU, TZU-HAO, 劉子豪
    Published 2018
    ... of the device. In the first section, the negative transparent photoresist and polyacrylic acid were used...
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  19. 439
    by Chun-Ping Lin, 林峻鵬
    Published 2012
    ... photoresist on core of fiber with short periodic Bragg surface grating. Moreover, and utilizes polymer...
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  20. 440
    by Wang, Ningyuan
    Published 2011
    ... contact switch fabrication. The photoresist melting in the photoresist sandwich structure is observed. A...
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