Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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401“... on the NA of microlens, fabricated by reflow process using photoresist, are also investigated. Geometry...”
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402“... an adjustable D-shaped fiber of Bragg surface grating filter component by utilizing thickness of photoresist...”
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403“... into the problem of metallic impurity diffusion across the photoresist/substrate interface in lithographical...”
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404“... and photoresist removal can pattern micro-hole array. Fourth, micro-cylindrical pattern in photoresist is formed...”
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405“... the temperature in process to grow CNTs on flexible substrate. At the same time, using negative type photoresist...”
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406“... processes. From a plasma process performed by 300 mm photoresist stripper equipment, a strong correlation...”
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407“... principle in this procedure is that the colμmnar positive photoresist（AZ4620）patterned by the lithography...”
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408“...碩士 === 逢甲大學 === 資訊電機工程碩士在職專班 === 97 === Photoresist coating technology has become quite mature...”
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409“... reflow process. During the photoresist thermal reflow process, the elliptical base can precisely define...”
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410“... glass photo process parameters and post exposure bake, uniformity of glass photoresist passivation...”
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411“.... In the traditional lithography process for integrated circuit manufacture, photoresist removal step is an inevitable...”
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412“... on the photolithography as a positive working photoresist were investigated. The aquueous solution of NQD...”
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413“... to develop new TFT imprint photoresist, three kind of materials, AZ-series photoresist (AZ-650 a positive...”
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414“... printing to pattern a mask onto photoresist for further microstructure formation. The advantages of using...”
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415by Croisy, Marion“... étudiés et des solutions ont été apportées. === Stripping photoresist after High Dose Implantation (HDI...”
Published 2017
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416“... found out the key cause of the photoresist residue removal problem was in the structure of the coating...”
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417“... efficiency for five waste photoresists and five waste strippers. The obtained results indicated as follows...”
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418by Li, Lifeng.“..., the theoretical analysis of waveguide gratings, and fabrication techniques for photoresist grating masks...”
Published 1988
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419“..., was coating the FTO electrodes with photoresist, then arrayed monolayer SiO2 nano-spheres on the photoresist...”
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420“... the objective lens, laser beam will focus vertically on the SU-8 photoresist. To find the appropriate exposure...”
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