Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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381“... is used to make optical master disks, the laser beam is directly illuminated on the surface of photoresist...”
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382“... is used to pattern photoresist microstructures on a curved substrate. By using micro electroforming...”
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383by Wei-Ming Tsao, 曹偉銘“... photoresist remained thicknesses and profiles after development. This technique has been applied to the photo...”
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384“... and used photoresist to record interferene-stripes generating from the interference of 442nm wavelength...”
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385“... attenuation of the surface plasmon polaritons (SPPs) in the photoresist layer. The calculation results suggest...”
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386“... growth in many fields, especially in the semiconductor and display industries. Photoresist etching...”
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387“..., in photoresist strip step of high dose implant process, carbonized photoresist residue becomes a critical issue...”
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388“... be simpler, faster and cheaper. The SU-8 and KMPR thick photoresists are used in photolithography process...”
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389“... photoresist ashing rates and concentration of various active species in the plasma. variations in ashing rates...”
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390“... of PDMS (Polydimethylsiloxane) against photolithographically patterned lines of photoresist on a silicon...”
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391“...-linker) into the gelatin solution to make it photosensitive and becomes a negative photoresist...”
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392“... recipe is using 30wt% KOH with different isopropyl concentrations in etching photoresist covered (100...”
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393“... depth and the full-width-at-half-magnitude (FWHM) of patterned photoresist (PR) nanostructures increased...”
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394“... of the suspended photoresist microstructures. Depending on the established processing data, different 3D...”
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395Study on the application of supercritical CO2 in semiconductor processing and Field Emission Devices“...2 fluid. In the traditional lithography process for integrated circuit manufacture, photoresist...”
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396“.... Photoresist removal is an indispensable process in integrated circuit fabrication. O2 plasma and wet stripper...”
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397“... patterns to the photoresist on the photomask or wafer. The design of the laser writer is using optical...”
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398“.... The photolithography techniques was used to produce the patterns of different sizes on the photoresist layer above...”
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399“... that the technique can effectively reduce the exposed pit width on the photoresist layer. The technique...”
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400“... three-electrode electrochemical detector, a photoresist layer constitutes both an adhesion layer...”
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