Suggested Topics within your search.
Suggested Topics within your search.
Photoresists
7
Laser beams
3
Gray scale
2
Microstructure
2
3D microstructures
1
Acrylics
1
Aqua Regia
1
Aqua regia
1
Bacteria
1
Beam system
1
Blood
1
Contact position
1
Contrast curve
1
Curve fitting
1
Curve shape
1
Cutting edges
1
Differential scanning calorimetry
1
Diffraction
1
Diffraction intensity
1
Diffusion
1
Direct write lithography
1
Direct-write lithography
1
Electrodes
1
Electromotive force
1
Emulsification
1
Expensive equipments
1
Exposure correction
1
Fabrication
1
Feature sizes
1
Figure of merit
1
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361“... be divided into two parts, namely, the non-photoresist zone detection and photoresist zone detection. Defects...”
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362“... of the optical pickup head may expose the photoresist between two successive exposed spots. To solve the first...”
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363“...碩士 === 國立臺灣科技大學 === 材料科學與工程系 === 100 === In this study, nanostructures of photoresists were...”
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364“... were modified using chemical reduction method, followed by mixing them into a commercial photoresist...”
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365by 孫炳欽“... an electrodeposition or electroforming deposit on a photoresist. This is usually and important process to produce...”
Published 1999
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366“...碩士 === 國立成功大學 === 工程科學系專班 === 95 === Photoresist stripping is last step of the lithography process...”
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367“... the priority, examination and determine the main factor. Hypothesis test: Implement B photoresist to 2nd Source...”
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368“.... The photoresist area and non-photoresist area of the packaging level glass are detected. In the photoresist area...”
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369“... which developing a new photoresist with temperature sensitive characteristic that can breakthrough...”
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370“... of the photoresist, the acrylate resin, i.e., poly(BZMA-MAA-2HEMA). The optimal composition of the prepared binder...”
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371“...碩士 === 中原大學 === 機械工程研究所 === 103 === In order to reduces photoresist waste rate and costs...”
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372“... positive photoresist (A-type) material on the dry process evaluation was a major topic worth studying...”
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373“... diffractive optical elements. In addition, we can also coat the photoresist on the glass...”
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374“... of micron nickel metal needles. Using positive photoresist (AZ4620) and negative photoresist (SU8-50...”
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375“... in photoresist film. In this thesis, we first use two-beam interference to record holographic grating...”
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376by 溫紫菱“...碩士 === 國立交通大學 === 工業工程與管理學系 === 99 === This study addresses the photoresist nozzle allocation...”
Published 2011
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377“... permeability gas as barrier layer structure for the different morphologies of the photoresist pattern. Research...”
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378“... sealed micro channels by using negative photoresist SU-8. In previous studies, fabricating sealed micro...”
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379“... issues from traditional immersion lithography process such as characteristics of photoresist changed...”
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380“... method of microlens is Photoresist thermal reflow process. But this method maybe face some problems...”
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