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  1. 261
    Using the Taguchi-Genetic Algorithm to Improve Lithographic Photoresist Operating Conditions of Touch Panels to Upgrade After-Develop Inspection
    by Meng-Hua Li, Shen-Tsu Wang
    Published 2018-11-01
    “.... The black matrix (BM) in an OGS touch panel is used as a black frame. The photoresist is divided into a...”
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    Article
  2. 262
    A Novel Embedded Root Method for Constructing Thick Metal Microstructures with SU-8 Photoresist in UV-LIGA Process
    by Chien-Hung Ho, 何鍵宏
    Published 2003
    “...博士 === 國立交通大學 === 機械工程系 === 91 === The photoresist, NANOTM XP SU-8, has been implemented...”
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  3. 263
    A Study on Improvement of White Smoke Reduction and Condenser Retrieval Efficiency of Photoresist Stripper Exhausting Systems in Optoelectronic Plants
    by Tsai, Min-huang, 蔡旻遑
    Published 2011
    “... of the photoresist stripping process in the TFT-LCD mostly relies on the condenser technology commonly used in semi...”
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  4. 264
    The application of Taguchi methods to parameters optimization for photoresist production conditions to enhance ADI process quality in touch panel industry
    by Jin Hung Weng, 翁錦鋐
    Published 2015
    “... of a negative type photoresist, and developing process size measurement inspection after development...”
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  5. 265
    Determining the root causes of excess metal and void defects with respect to the photoresist quality in thin film PZT fabrication processes
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  6. 266
    Top surface imaging for sub-100nm lithography
    by Jamieson, Andrew Thomas
    Published 2008
    Subjects: “...Photoresists...”
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  7. 267
    Design, synthesis, and evaluation of materials for microelectronics applications
    by Heath, William Hoy
    Published 2008
    Subjects: “...Photoresists...”
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  8. 268
    Metallized printed microstructures for precision biomedical recording and stimulation
    by Gleick, Jeremy
    Published 2019
    Subjects: “...Photoresist...”
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  9. 269
    LED ULTRAVIOLET EXPOSURE UNIT WITH ADJUSTABLE EXPOSURE TIME
    Subjects: “...thick-film photoresist...”
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    Article
  10. 270
    Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas
    Subjects: “...AZ-1518 photoresist...”
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    Article
  11. 271
    Fabrication of a soft magnetic toroidal core using electrodeposition and UV-lithography
    by Sällström, Pär
    Published 2009
    Subjects: “...thick photoresist...”
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  12. 272
    Photocrosslinkable polymers for temporally stable organic nonlinear optical materials and dual-tone photolithography
    by Rawlings, Brandon Mark
    Published 2013
    Subjects: “...Dual-tone photoresist...”
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  13. 273
    A Study on the Step Coverage of the Gas Barrier Structure Deposited onto the Photoresist with the Undercut Pattern Modified by a Thick Film
    by SU, YONG-JI, 蘇永吉
    Published 2019
    “...(VHF-PECVD) to rapidly deposite organosilicon thick film on the undercut pattern photoresist surface...”
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  14. 274
    Micropatterning Method for Porous Materials Using the Difference of the Glass Transition Temperature between Exposed and Unexposed Areas of a Thick-Photoresist
    by Hidetaka Ueno, Kiichi Sato, Kou Yamada, Takaaki Suzuki
    Published 2019-12-01
    Subjects: “...thick photoresist...”
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    Article
  15. 275
    Microfluidic Long-Term Gradient Generator with Axon Separation Prototyped by 185 nm Diffused Light Photolithography of SU-8 Photoresist
    “...) light from an inexpensive low-pressure mercury lamp exposed a layer of the SU-8 photoresist from...”
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    Article
  16. 276
    Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition
    by Rathsack, Benjamen Michael
    Published 2011
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  17. 277
    Scanning Near Field Optical Microscopy Lithography Dot Processed Mode Analysis of Photoresist layer Coating Indium Thin Film
    by Chao. Jung. Lin, 林朝榮
    Published 2005
    “... effectively reduce the exposed pit width on the photoresist layer. The technique makes use of a thin...”
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  18. 278
    Effects of photolithography process parameters of the half-tone mask on cross-sectional morphologies and thicknesses of the channel photoresist of thin film transistors
    “... and thicknesses of the channel photoresist of thin film transistors in the SE/SD photolithography process step...”
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  19. 279
    Study of Prevention of Disclination Lines in Liquid Crystal Lens Arrays via Individual Addition of Patterned and Non-patterned Photoresist Films
    by Pin-HungTang, 唐賓鴻
    Published 2015
    “...-patterned SU8 photoresist films on hole-patterned ITO films of glass substrates used to prevent the problem...”
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  20. 280
    PHENOMENA OCCURRING IN ACHIEVING INTEGRATED CIRCUIT BOARDS USING ULTRAVIOLET LIGHT
    by BARBU Ion
    Published 2014-05-01
    Subjects: “...photoresist...”
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    Article
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