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  1. 181
    Characterization of Line Nanopatterns on Positive Photoresist Produced by Scanning Near-Field Optical Microscope
    “...Line nanopatterns are produced on the positive photoresist by scanning near-field optical...”
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  2. 182
    Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope
    Subjects: “...photoresist...”
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  3. 183
    Oxygen plasma stripping of photoresist from bipolar integrated circuit wafers - process development
    by Ulanmo, Peter Obiajulu
    Published 1981
    “...The development of a plasma strip process, in which an oxygen plasma removes photoresist films from...”
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  4. 184
    Study on Synthesis and Lithographic Performance of 193nm Negative-tone Photoresist for IC Process
    by Ko Jeng-Dar, 柯正達
    Published 2002
    “..., the photoresist was proved possessing the negative-tone pattern transfer characteristics. However, the acid...”
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  5. 185
    STUDY ON THE SYNTHESIS OF POLYMER WITH TERT-BUTYL GROUP AND THEIR CHARACTERS ON THE CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST
    by Hsien-Yu Yang, 楊顯猷
    Published 2005
    “... (THF). This photoresist is chemical amplified photoresist, exposured under Deep-UV (248nm...”
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  6. 186
    The study of LIGA-like technology in manufacturing refractive microlens arrays with SU-8 photoresist
    by Ling-Ying Chiang, 強玲英
    Published 2000
    “.... The EPON® SU-8 is a negative, epoxy-type, near-UV photoresist and usually used to fabricate high aspect...”
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  7. 187
    Investigations of As-S-Se thin films for use as inorganic photoresist for digital image-matrix holography
    Subjects: “...inorganic photoresist...”
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  8. 188
    Destruction of Photoresist Thinner Adsorbed on Active Carbon by Using Atmospheric-Pressure Microwave Plasma
    by Yu-Ting Liu, 劉宇婷
    Published 2011
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  9. 189
    Development of the Double-side Multiple Partial Exposure Method with Negative Photoresist SU-8
    by Huang, Yuan-Te, 黃元德
    Published 2014
    “... method uses standard lithography equipment and needs only single-layer coating of negative photoresist SU...”
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  10. 190
    Different fracture approaches to induce ripple patterns on non-irradiated and irradiated photoresist film
    by Lee, Yueh-Ying, 李玥瑩
    Published 2012
    “...: the photoresist thin film is first sandwiched by two rigid Si substrates. After heating and pressing, those...”
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  11. 191
    Micropostioning thickness control system of photoresist lay on LCD back-lighted glass plate
    by K. H. Chang, 章廣賢
    Published 2000
    “... and a long-range mechanism. After combining, the whole system could be applied on lying photoresist...”
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  12. 192
    Construction of 2.5D microstructure using multiple layers of SU-8 photoresist
    by Chi-Hsun Yang, 楊奇勳
    Published 2001
    “... by using the UV-LIGA technology. Through the second coating of SU-8 thick photoresist and electroplating...”
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  13. 193
    Fabrication of Photoresist Nanostructures on the Silicon Surface by E-beam lithography and Characterization of Adhesion Property
    by Jing-Hong Wang, 王景弘
    Published 2010
    “...碩士 === 國立臺灣科技大學 === 高分子系 === 98 === In this study, nanostructures of photoresists were fabricated...”
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  14. 194
    Fabrication of High Aspect Ratio Copper Interconnect Using Thick-film Photoresist Process
    by R. C. Chang, 張瑞宗
    Published 1999
    “...碩士 === 國立交通大學 === 材料科學與工程系 === 87 === In this work, we formed vias in thick-film photoresist...”
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  15. 195
    A Photoresist Passivated Carbon Nanotubes Field Effect Transistor for Recognition of Ion Concentration
    by 蕭程允
    Published 2005
    “... with photoresist passivated and non-passivated under adding a liquid-gate. The passivated layer, formed over...”
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  16. 196
    Fabrication of Microchannels Using Thick Photoresist as Sacrificial Layers with SU-8 as Channel Structures
    by Chih- Hsien Yang, 楊志賢
    Published 2003
    “... and negative photoresists conduct the processes of fabrication. It provides low cost, simple processes...”
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  17. 197
    Utilization of plasma etching technique for studing the fabrication of nanometer scale based photoresist lines
    by Lin, Shih-Kai, 林世凱
    Published 2010
    “... the plasma etching technique for studing the fabrication of nanometer scale based photoresist lines. All...”
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  18. 198
    Photoresist reduction study of bumping positive photo coating process by Response Surface Methodology
    by Tong Yi Ling, 凌東毅
    Published 2014
    “...碩士 === 國立高雄大學 === 電機工程學系碩士班 === 102 === This thesis study the photoresist reduction parameter...”
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  19. 199
    Modeling and analysis of extrusion-spin coating : an efficient and deterministic photoresist coating method in microlithography
    by Han, Sangjun, 1972-
    Published 2005
    “... step in this process is the deposition of a thin and uniform layer of photoresist (often called resist...”
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  20. 200
    The Research of Photoresist Residue of Wafer Level Chip Scale Package Redistribution Layer Process
    by Chen-Kun Liu, 劉振坤
    Published 2016
    “... problems. The fourth chapter, discuss RDL exposure process photoresist residue problems occurs from...”
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