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1“...碩士 === 大葉大學 === 機械工程學系碩士班 === 91 === The aluminum foils for electrolytic capacitors were etched...”
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2“...碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 100 === Plasma etching technology is large and widely used...”
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4“... thermally grown on reactive-ion-etched (RIE) silicon substrates in N2O and diluted O2 ambient...”
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8by Nadzri A., Schauries D., Afra B., Rodriguez M. D., Mota-Santiago P., Muradoglu S., Hawley A., Kluth P.“... (SAXS) measurements before and after chemical etching. We present preliminary results from the SAXS...”
Published 2015-01-01
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10by Timur V. Melkumyan, Diloro J. Kakhkharova, Anjela D. Dadamova, Nuriddin Kh. Kamilov, Sitora Sh. Siddikova, Shakhlo I. Rakhmatullaeva, Seyederfan M. Masouleh“... application of total-etch and self-etch adhesive systems. Materials and Methods: Four adhesive systems were...”
Published 2016-12-01
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11“.... Two adhesive systems, namely self-etch and total-etch adhesive systems are developed for adhering...”
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12“... in the TFT LCD panel manufacturing process. Such as dry etching, thin films deposited, and stripper…etc...”
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13“... resist will result in the pattern damage during pattern transfer by dry etch. So, We need to implement...”
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14“... MOSFET self-aligned process well-controlled, information about dry etching and wet etching must...”
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18by El Otell, Ziad“... dynamics for the purpose of tailoring the plasma properties for neutral beam etching (NBE) applications. A...”
Published 2013
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