Ultra-wide detuning planar Bragg grating fabrication technique based on direct UV grating writing with electro-optic phase modulation

• Main Authors: Sima, C. (Author), Gates, J.C (Author), Rogers, H. (Author), Mennea, P. (Author), Holmes, C. (Author), Zervas, M.N (Author), Smith, P.G.R (Author)
• Format: Article
• Language: English
• Published: 2013-07-01.
• Subjects: Article
• Online Access: Get fulltext

A direct UV grating writing technique based on phase-controlled interferometry is proposed and demonstrated in a silica-on-silicon platform, with a wider wavelength detuning range than any previously reported UV writing technology. Electro-optic phase modulation of one beam in the interferometer is used to manipulate the fringe pattern and thus control the parameters of the Bragg gratings and waveguides. Various grating structures with refractive index apodization, phase shifts and index contrasts of up to 0.8×10^-3 have been demonstrated. The method offers significant time/energy efficiency as well as simplified optical layout and fabrication process. We have shown Bragg gratings can be made from 1200 nm to 1900 nm exclusively under software control and the maximum peak grating reflectivity only decreases by 3dB over a 250 nm (~32THz) bandwidth.