Near-infrared narrow-band minus filter based on a Mie magnetic dipole resonance

The traditional minus filter is composed of many layers of thin films, which makes it difficult and complicated to manufacture. It is sensitive to incident light angle and polarization. Here, we propose a near-infrared narrow-band minus filter with a full width at half maximum around 5 nm made of al...

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Bibliographic Details
Main Authors: Gao, J. (Author), Li, Q. (Author), Liu, H. (Author), Liu, Z. (Author), Shen, Z. (Author), Wang, K. (Author), Wang, T. (Author), Wang, X. (Author), Wang, Y. (Author), Xiong, Y. (Author), Yang, H. (Author), Zhang, J. (Author)
Format: Article
Language:English
Published: Optica Publishing Group (formerly OSA) 2022
Online Access:View Fulltext in Publisher
LEADER 01982nam a2200277Ia 4500
001 10.1364-OE.454541
008 220630s2022 CNT 000 0 und d
020 |a 10944087 (ISSN) 
245 1 0 |a Near-infrared narrow-band minus filter based on a Mie magnetic dipole resonance 
260 0 |b Optica Publishing Group (formerly OSA)  |c 2022 
520 3 |a The traditional minus filter is composed of many layers of thin films, which makes it difficult and complicated to manufacture. It is sensitive to incident light angle and polarization. Here, we propose a near-infrared narrow-band minus filter with a full width at half maximum around 5 nm made of all-dielectric Si-SiO2 structures without any ohmic loss. The stop band transmittance of the proposed filter is close to 0, while its broad pass band transmittance is as high as 90% in the work wavelength range. Theoretical analysis shows that the transmission dip originated from magnetic dipole resonance: Its position can be tuned from 1.3 µm to 1.8 µm by changing the thickness of Si structure, and the proposed structure is insensitive to changes in incident light angle and polarization angle. We further studied its potential applications as a refractive index sensor. The sensitivity of dip1 and dip2 are as high as 953.53 nm/RIU and 691.09 nm/RIU, while their figure of merit is almost unchanged: 59.59 and 115.18, respectively. © 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement 
700 1 0 |a Gao, J.  |e author 
700 1 0 |a Li, Q.  |e author 
700 1 0 |a Liu, H.  |e author 
700 1 0 |a Liu, Z.  |e author 
700 1 0 |a Shen, Z.  |e author 
700 1 0 |a Wang, K.  |e author 
700 1 0 |a Wang, T.  |e author 
700 1 0 |a Wang, X.  |e author 
700 1 0 |a Wang, X.  |e author 
700 1 0 |a Wang, Y.  |e author 
700 1 0 |a Xiong, Y.  |e author 
700 1 0 |a Yang, H.  |e author 
700 1 0 |a Zhang, J.  |e author 
773 |t Optics Express 
856 |z View Fulltext in Publisher  |u https://doi.org/10.1364/OE.454541