The effects of match circuit on the breakdown process of capacitively coupled plasma driven by radio frequency

The breakdown process of capacitively coupled plasma (CCP) in the presence of a matching network is rarely studied, even though it is the indispensable part of the most laboratory and industrial devices of CCP. Based on the method of Verboncoeur, the solution method of the general "L"-type...

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Bibliographic Details
Main Authors: Chen, Z. (Author), Jiang, W. (Author), Li, X. (Author), Wang, Q. (Author), Wu, H. (Author), Yu, S. (Author), Zhang, Y. (Author)
Format: Article
Language:English
Published: American Institute of Physics Inc. 2022
Subjects:
Online Access:View Fulltext in Publisher
LEADER 02825nam a2200385Ia 4500
001 10.1063-5.0085311
008 220510s2022 CNT 000 0 und d
020 |a 00218979 (ISSN) 
245 1 0 |a The effects of match circuit on the breakdown process of capacitively coupled plasma driven by radio frequency 
260 0 |b American Institute of Physics Inc.  |c 2022 
856 |z View Fulltext in Publisher  |u https://doi.org/10.1063/5.0085311 
520 3 |a The breakdown process of capacitively coupled plasma (CCP) in the presence of a matching network is rarely studied, even though it is the indispensable part of the most laboratory and industrial devices of CCP. Based on the method of Verboncoeur, the solution method of the general "L"-type match circuit coupled with a particle-in-cell/Monte Carlo code is deduced self-consistently. Based on this method, the electrical breakdown process of CCP is studied. Both the plasma parameters and the electric parameters of the matching network during the breakdown are given and analyzed. In the pre-breakdown phase, the entire circuit can be considered as a linear system. However, the formation of the sheath during breakdown significantly enhanced the capacitance of the discharge chamber, which changed the electric signal amplitude of the external circuit. With the stabilization of plasma, the equivalent capacitance of CCP increases, which continues to change the electrical signal until the steady-state is reached. Accompanied by plasma stabilization is the appearance of high-order harmonics of discharge current caused by the gradually oscillating CCP capacitance. The breakdown characteristics can be obviously affected by the capacitance of the matching network. In the case of a breakdown zone, some breakdowns with special characteristics can be obtained by choosing the different capacitors. These works might be a reference for understanding the interaction between the plasma and the external circuit during the breakdown process and how to modulate the gas breakdown by controlling the external circuit. © 2022 Author(s). 
650 0 4 |a A-particles 
650 0 4 |a Breakdown process 
650 0 4 |a Capacitance 
650 0 4 |a Capacitively coupled plasmas 
650 0 4 |a Electric discharges 
650 0 4 |a External circuits 
650 0 4 |a Industrial devices 
650 0 4 |a Laboratory devices 
650 0 4 |a Linear systems 
650 0 4 |a Matching networks 
650 0 4 |a Particle in cell 
650 0 4 |a Radiofrequencies 
650 0 4 |a Solution methods 
650 0 4 |a Stabilization 
650 0 4 |a Timing circuits 
700 1 |a Chen, Z.  |e author 
700 1 |a Jiang, W.  |e author 
700 1 |a Li, X.  |e author 
700 1 |a Wang, Q.  |e author 
700 1 |a Wu, H.  |e author 
700 1 |a Yu, S.  |e author 
700 1 |a Zhang, Y.  |e author 
773 |t Journal of Applied Physics