Amorphous Metal Oxide Thin Films from Aqueous Precursors: New Routes to High-κ Dielectrics, Impact of Annealing Atmosphere Humidity, and Elucidation of Non-uniform Composition Profiles
Metal oxide thin films serve as critical components in many modern technologies, including microelectronic devices. Industrial state-of-the-art production utilizes vapor-phase techniques to make high-quality (dense, smooth, uniform) thin film materials. However, vapor-phase techniques require large...
| Main Author: | |
|---|---|
| Other Authors: | |
| Language: | en_US |
| Published: |
University of Oregon
2018
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1794/23173 |