The Influence of Ohmic Metals and Oxide Deposition on the Structure and Electrical Properties of Multilayer Epitaxial Graphene on Silicon Carbide Substrates

Graphene has attracted significant research attention for next generation of semiconductor devices due to its high electron mobility and compatibility with planar semiconductor processing. In this dissertation, the influences of Ohmic metals and high dielectric (high-k) constant aluminum oxide (Al2O...

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Bibliographic Details
Main Author: Maneshian, Mohammad Hassan
Other Authors: Shepherd, Nigel
Format: Others
Language:English
Published: University of North Texas 2011
Subjects:
Online Access:https://digital.library.unt.edu/ark:/67531/metadc68009/

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