Physical models for numerical simulation of Si-based nanoscale FETs and sensors

To continuously improve the performance of metal-oxide-semiconductor field-effect-transistors (MOSFETs), innovative device architectures, gate stack engineering and mobility enhancement techniques are under investigation. In this framework, new physics-based models for Technology Computer-Aided-Desi...

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Bibliographic Details
Main Author: Silvestri, Luca <1981>
Other Authors: Reggiani, Susanna
Format: Doctoral Thesis
Language:en
Published: Alma Mater Studiorum - Università di Bologna 2011
Subjects:
Online Access:http://amsdottorato.unibo.it/3731/
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spelling ndltd-unibo.it-oai-amsdottorato.cib.unibo.it-37312014-03-24T16:29:20Z Physical models for numerical simulation of Si-based nanoscale FETs and sensors Silvestri, Luca <1981> ING-INF/01 Elettronica To continuously improve the performance of metal-oxide-semiconductor field-effect-transistors (MOSFETs), innovative device architectures, gate stack engineering and mobility enhancement techniques are under investigation. In this framework, new physics-based models for Technology Computer-Aided-Design (TCAD) simulation tools are needed to accurately predict the performance of upcoming nanoscale devices and to provide guidelines for their optimization. In this thesis, advanced physically-based mobility models for ultrathin body (UTB) devices with either planar or vertical architectures such as single-gate silicon-on-insulator (SOI) field-effect transistors (FETs), double-gate FETs, FinFETs and silicon nanowire FETs, integrating strain technology and high-κ gate stacks are presented. The effective mobility of the two-dimensional electron/hole gas in a UTB FETs channel is calculated taking into account its tensorial nature and the quantization effects. All the scattering events relevant for thin silicon films and for high-κ dielectrics and metal gates have been addressed and modeled for UTB FETs on differently oriented substrates. The effects of mechanical stress on (100) and (110) silicon band structures have been modeled for a generic stress configuration. Performance will also derive from heterogeneity, coming from the increasing diversity of functions integrated on complementary metal-oxide-semiconductor (CMOS) platforms. For example, new architectural concepts are of interest not only to extend the FET scaling process, but also to develop innovative sensor applications. Benefiting from properties like large surface-to-volume ratio and extreme sensitivity to surface modifications, silicon-nanowire-based sensors are gaining special attention in research. In this thesis, a comprehensive analysis of the physical effects playing a role in the detection of gas molecules is carried out by TCAD simulations combined with interface characterization techniques. The complex interaction of charge transport in silicon nanowires of different dimensions with interface trap states and remote charges is addressed to correctly reproduce experimental results of recently fabricated gas nanosensors. Alma Mater Studiorum - Università di Bologna Reggiani, Susanna 2011-04-15 Doctoral Thesis PeerReviewed application/pdf en http://amsdottorato.unibo.it/3731/ info:eu-repo/semantics/openAccess
collection NDLTD
language en
format Doctoral Thesis
sources NDLTD
topic ING-INF/01 Elettronica
spellingShingle ING-INF/01 Elettronica
Silvestri, Luca <1981>
Physical models for numerical simulation of Si-based nanoscale FETs and sensors
description To continuously improve the performance of metal-oxide-semiconductor field-effect-transistors (MOSFETs), innovative device architectures, gate stack engineering and mobility enhancement techniques are under investigation. In this framework, new physics-based models for Technology Computer-Aided-Design (TCAD) simulation tools are needed to accurately predict the performance of upcoming nanoscale devices and to provide guidelines for their optimization. In this thesis, advanced physically-based mobility models for ultrathin body (UTB) devices with either planar or vertical architectures such as single-gate silicon-on-insulator (SOI) field-effect transistors (FETs), double-gate FETs, FinFETs and silicon nanowire FETs, integrating strain technology and high-κ gate stacks are presented. The effective mobility of the two-dimensional electron/hole gas in a UTB FETs channel is calculated taking into account its tensorial nature and the quantization effects. All the scattering events relevant for thin silicon films and for high-κ dielectrics and metal gates have been addressed and modeled for UTB FETs on differently oriented substrates. The effects of mechanical stress on (100) and (110) silicon band structures have been modeled for a generic stress configuration. Performance will also derive from heterogeneity, coming from the increasing diversity of functions integrated on complementary metal-oxide-semiconductor (CMOS) platforms. For example, new architectural concepts are of interest not only to extend the FET scaling process, but also to develop innovative sensor applications. Benefiting from properties like large surface-to-volume ratio and extreme sensitivity to surface modifications, silicon-nanowire-based sensors are gaining special attention in research. In this thesis, a comprehensive analysis of the physical effects playing a role in the detection of gas molecules is carried out by TCAD simulations combined with interface characterization techniques. The complex interaction of charge transport in silicon nanowires of different dimensions with interface trap states and remote charges is addressed to correctly reproduce experimental results of recently fabricated gas nanosensors.
author2 Reggiani, Susanna
author_facet Reggiani, Susanna
Silvestri, Luca <1981>
author Silvestri, Luca <1981>
author_sort Silvestri, Luca <1981>
title Physical models for numerical simulation of Si-based nanoscale FETs and sensors
title_short Physical models for numerical simulation of Si-based nanoscale FETs and sensors
title_full Physical models for numerical simulation of Si-based nanoscale FETs and sensors
title_fullStr Physical models for numerical simulation of Si-based nanoscale FETs and sensors
title_full_unstemmed Physical models for numerical simulation of Si-based nanoscale FETs and sensors
title_sort physical models for numerical simulation of si-based nanoscale fets and sensors
publisher Alma Mater Studiorum - Università di Bologna
publishDate 2011
url http://amsdottorato.unibo.it/3731/
work_keys_str_mv AT silvestriluca1981 physicalmodelsfornumericalsimulationofsibasednanoscalefetsandsensors
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