Novel Concepts in the PECVD Deposition of Silicon Thin Films : from Plasma Chemistry to Photovoltaic Device Applications

Novel Concepts in the PECVD Deposition of Silicon Thin Films : from Plasma Chemistry to Photovoltaic Device Applications

Ce manuscrit présente l'étude de la fabrication de couches minces de silicium basée sur des différents types de dépôt chimique en phase vapeur assisté par plasma (PECVD) pour des applications dans le photovoltaïque. Tout d'abord, nous avons combiné une chimie du plasma halogéné en utilisan...

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Bibliographic Details
Main Author:	Wang, Junkang
Other Authors:	Université Paris-Saclay (ComUE)
Language:	en
Published:	2017
Subjects:	Silicium couches minces Photovoltaïque Dépôt chimique en phase vapeur assisté par plasma Résonance cyclotron électronique Tailored voltage waveforms Énergie des ions Silicon thin film Photovoltaic Plasma enhanced chemical vapor deposition Electron cyclotron resonance Ion energy
Online Access:	http://www.theses.fr/2017SACLX079/document

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