Etude des interactions plasma/surface pour la compréhension de la croissance de couches minces SiCN : H et leur interface film/substrat : répercussions sur leurs propriétés

Etude des interactions plasma/surface pour la compréhension de la croissance de couches minces SiCN : H et leur interface film/substrat : répercussions sur leurs propriétés

Les matériaux SiNOC:H en couches minces, de par leur flexibilité stœchiométrique, présentent une vaste gamme de propriétés et sont aujourd'hui utilisés industriellement dans de nombreuses applications : microélectronique, photovoltaïque, mécanique, etc. Nous avons ici choisi de nous intér...

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Bibliographic Details
Main Author:	Plujat, Beatrice
Other Authors:	Perpignan
Language:	fr
Published:	2017
Subjects:	PECVD Microonde TMS Couches minces SiCN:H Modes de croissance Microwave Thin films Growth modes 620 670
Online Access:	http://www.theses.fr/2017PERP0019/document

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