La lithographie par double impression pour les noeuds technologiques avancés

La lithographie par double impression pour les noeuds technologiques avancés

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La lithographie par double impression est une solution potentielle proposée pour l'impression des circuits des nœuds technologiques avancés (22nm et au-delà) en attendant que la lithographie Extrême Ultraviolet soit prête pour la production en masse. La technique de double impression est basée...

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Bibliographic Details
Main Author:	Zeggaoui, Nassima
Other Authors:	Grenoble
Language:	fr
Published:	2011
Subjects:	Lithographie optique Diffraction optique Décomposition Coloriage Conflits Optical lithography Optical diffraction Split layout Coloring Conflicts
Online Access:	http://www.theses.fr/2011GRENT047/document

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