Efficient vlsi yield prediction with consideration of partial correlations
With the emergence of the deep submicron era, process variations have gained importance in issues related to chip design. The impact of process variations is measured using manufacturing/parametric yield. In order to get an accurate estimate of yield, the parameters considered need to be monitored a...
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| Format: | Others |
| Language: | en_US |
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2010
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| Online Access: | http://hdl.handle.net/1969.1/ETD-TAMU-2503 http://hdl.handle.net/1969.1/ETD-TAMU-2503 |