Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint

High-resolution and low-cost fabrication techniques are essential for nanotechnology to overcome the commercialization barrier to benefit our society. Since its inception nanoimprint has become the ideal technology to fabricate dense sub-micron structures over large areas with low cost, which are im...

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Main Author: Lunsford, Patrick
Other Authors: Cheng, Xing
Format: Others
Language:en_US
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/1969.1/ETD-TAMU-2010-12-9026
id ndltd-tamu.edu-oai-repository.tamu.edu-1969.1-ETD-TAMU-2010-12-9026
record_format oai_dc
spelling ndltd-tamu.edu-oai-repository.tamu.edu-1969.1-ETD-TAMU-2010-12-90262013-01-08T10:42:43ZStability of Self-Assembled Monolayer Surfactant Coating in Thermal NanoimprintLunsford, Patricksurfactant coatingnanoimprintanti-adhesion embeddingHigh-resolution and low-cost fabrication techniques are essential for nanotechnology to overcome the commercialization barrier to benefit our society. Since its inception nanoimprint has become the ideal technology to fabricate dense sub-micron structures over large areas with low cost, which are important to many applications such as high-density storage disks and diffractive optical devices. The decade-long development in nanoimprint equipment has reached a point where large-scale manufacturing of high-density nanostructures are possible. However, there are a few remaining issues that need to be studied before the advent of commercial application of nanoimprint. In this work we look at a pressing issue, long-term stability of the mold surfactant coating. It is important to understand the details of the surfactant wear during nanoimprint in order to limit defect density to a tolerable threshold in a high-volume manufacturing process. To study this we went through a nanoimprinting procedure and measured chemical and physical alterations in the coating. The surfactant wear information also helps to optimize the time interval for surfactant recoating to keep the fabrication throughput as high as possible. In this paper we characterize the stability of two commonly used surfactants as well as prescribe a new technique for mold anti-adhesion. Through this work we see that FDTS and OTS undergo significant degradation in air and gradual degradation by chain scission is observed during the nanoimprint procedure. It is also noted that an embedded anti-adhesion layer is effective for mold releasing.Cheng, XingWang, Haiyan2012-02-14T22:19:09Z2012-02-16T16:12:46Z2012-02-14T22:19:09Z2012-02-16T16:12:46Z2010-122012-02-14December 2010thesistextapplication/pdfhttp://hdl.handle.net/1969.1/ETD-TAMU-2010-12-9026en_US
collection NDLTD
language en_US
format Others
sources NDLTD
topic surfactant coating
nanoimprint
anti-adhesion embedding
spellingShingle surfactant coating
nanoimprint
anti-adhesion embedding
Lunsford, Patrick
Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint
description High-resolution and low-cost fabrication techniques are essential for nanotechnology to overcome the commercialization barrier to benefit our society. Since its inception nanoimprint has become the ideal technology to fabricate dense sub-micron structures over large areas with low cost, which are important to many applications such as high-density storage disks and diffractive optical devices. The decade-long development in nanoimprint equipment has reached a point where large-scale manufacturing of high-density nanostructures are possible. However, there are a few remaining issues that need to be studied before the advent of commercial application of nanoimprint. In this work we look at a pressing issue, long-term stability of the mold surfactant coating. It is important to understand the details of the surfactant wear during nanoimprint in order to limit defect density to a tolerable threshold in a high-volume manufacturing process. To study this we went through a nanoimprinting procedure and measured chemical and physical alterations in the coating. The surfactant wear information also helps to optimize the time interval for surfactant recoating to keep the fabrication throughput as high as possible. In this paper we characterize the stability of two commonly used surfactants as well as prescribe a new technique for mold anti-adhesion. Through this work we see that FDTS and OTS undergo significant degradation in air and gradual degradation by chain scission is observed during the nanoimprint procedure. It is also noted that an embedded anti-adhesion layer is effective for mold releasing.
author2 Cheng, Xing
author_facet Cheng, Xing
Lunsford, Patrick
author Lunsford, Patrick
author_sort Lunsford, Patrick
title Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint
title_short Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint
title_full Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint
title_fullStr Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint
title_full_unstemmed Stability of Self-Assembled Monolayer Surfactant Coating in Thermal Nanoimprint
title_sort stability of self-assembled monolayer surfactant coating in thermal nanoimprint
publishDate 2012
url http://hdl.handle.net/1969.1/ETD-TAMU-2010-12-9026
work_keys_str_mv AT lunsfordpatrick stabilityofselfassembledmonolayersurfactantcoatinginthermalnanoimprint
_version_ 1716505153064927232