Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC)
Three illustrative cases involving the electrodeposition of ultrathin metal films of varying reactivities onto noble-metal substrates were investigated: (i) Pd on Pt(111), a noble admetal on a noble-metal surface; (ii) Bi on Pd(111), a less noble admetal on a noble-metal surface; and (iii) Co on pol...
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ndltd-tamu.edu-oai-repository.tamu.edu-1969.1-42912013-01-08T10:38:27ZElectrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC)Baricuatro, Jack Hess Lelectrodepositionultrathin filmsLEEDAEScyclic voltammetrycobaltbismuthPd(111)Pt(111)Three illustrative cases involving the electrodeposition of ultrathin metal films of varying reactivities onto noble-metal substrates were investigated: (i) Pd on Pt(111), a noble admetal on a noble-metal surface; (ii) Bi on Pd(111), a less noble admetal on a noble-metal surface; and (iii) Co on polycrystalline Pd and Pd(111), a reactive metal on a noble-metal surface. The interfacial electrochemistry of these prototypical systems was characterized using a combination of electrochemical methods (voltammetry and coulometry) and ultrahigh vacuum electron spectroscopies (Auger electron spectroscopy, AES; low energy electron diffraction, LEED; and X-ray photoelectron spectroscopy, XPS). Potential-controlled adsorption-desorption cycles of aqueous bromide exerted surface smoothening effects on ultrathin Pd films with defect sites (steps). This procedure, dubbed as electrochemical (EC) annealing, constituted a nonthermal analogue to conventional annealing. EC-annealed ultrathin Pd films exhibited long-range surface order and remained free of oxygen adspecies. Pdadatoms occupying step-sites were selectively dissolved and/or rearranged to assume equilibrium positions in a well-ordered (1x1) film. Electrodeposition of Co was found to be highly surface-structuresensitive. While virtually no Co electrodeposition transpired on a clean Pd(111) surface, Co was voltammetrically deposited on (i) a Pd(111) electrode roughened by oxidation-reduction cycles; and (ii) thermally annealed polycrystalline Pd, which is a composite of the (111) and (100) facets. Electrodeposition of Co was also observed to be kinetically hindered and slow potential scan rates (0.1 mV/s) were required. Well-defined ultrathin Bi films were potentiostatically electrodeposited onto Pd(111); a Stranski-Krastanov growth mode was indicated. The electrochemical reactivity of ultrathin Bi films was characterized using two surface probes: aqueous iodide and D-glucose. (i) Exposure of the prepared Bi adlayers (ÃÂBi 0.33) to aqueous iodide gave rise to (âÂÂ3xâÂÂ7) I-on-Bi superlattice. The same superlattice was obtained if Bi was electrodeposited onto Pd(111)(âÂÂ3xâÂÂ3)R30o-I. (ii) With respect to electrooxidation of D-glucose on Pd(111), the presence of Bi adlayers inhibited the by-product-induced "surface poisoning" of Pd(111) but reduced its electrocatalytic efficiency.Texas A&M UniversitySoriaga, Manuel P.2006-10-30T23:28:37Z2006-10-30T23:28:37Z2006-082006-10-30T23:28:37ZBookThesisElectronic Dissertationtext41352463 byteselectronicapplication/pdfborn digitalhttp://hdl.handle.net/1969.1/4291en_US |
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electrodeposition ultrathin films LEED AES cyclic voltammetry cobalt bismuth Pd(111) Pt(111) |
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electrodeposition ultrathin films LEED AES cyclic voltammetry cobalt bismuth Pd(111) Pt(111) Baricuatro, Jack Hess L Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC) |
description |
Three illustrative cases involving the electrodeposition of ultrathin metal
films of varying reactivities onto noble-metal substrates were investigated: (i) Pd
on Pt(111), a noble admetal on a noble-metal surface; (ii) Bi on Pd(111), a less
noble admetal on a noble-metal surface; and (iii) Co on polycrystalline Pd and
Pd(111), a reactive metal on a noble-metal surface. The interfacial
electrochemistry of these prototypical systems was characterized using a
combination of electrochemical methods (voltammetry and coulometry) and
ultrahigh vacuum electron spectroscopies (Auger electron spectroscopy, AES;
low energy electron diffraction, LEED; and X-ray photoelectron spectroscopy,
XPS).
Potential-controlled adsorption-desorption cycles of aqueous bromide
exerted surface smoothening effects on ultrathin Pd films with defect sites
(steps). This procedure, dubbed as electrochemical (EC) annealing, constituted a
nonthermal analogue to conventional annealing. EC-annealed ultrathin Pd films
exhibited long-range surface order and remained free of oxygen adspecies. Pdadatoms occupying step-sites were selectively dissolved and/or rearranged to
assume equilibrium positions in a well-ordered (1x1) film.
Electrodeposition of Co was found to be highly surface-structuresensitive.
While virtually no Co electrodeposition transpired on a clean Pd(111)
surface, Co was voltammetrically deposited on (i) a Pd(111) electrode
roughened by oxidation-reduction cycles; and (ii) thermally annealed
polycrystalline Pd, which is a composite of the (111) and (100) facets.
Electrodeposition of Co was also observed to be kinetically hindered and slow
potential scan rates (0.1 mV/s) were required.
Well-defined ultrathin Bi films were potentiostatically electrodeposited
onto Pd(111); a Stranski-Krastanov growth mode was indicated. The
electrochemical reactivity of ultrathin Bi films was characterized using two
surface probes: aqueous iodide and D-glucose. (i) Exposure of the prepared Bi
adlayers (ÃÂBi 0.33) to aqueous iodide gave rise to (âÂÂ3xâÂÂ7) I-on-Bi superlattice.
The same superlattice was obtained if Bi was electrodeposited onto
Pd(111)(âÂÂ3xâÂÂ3)R30o-I. (ii) With respect to electrooxidation of D-glucose on
Pd(111), the presence of Bi adlayers inhibited the by-product-induced "surface
poisoning" of Pd(111) but reduced its electrocatalytic efficiency. |
author2 |
Soriaga, Manuel P. |
author_facet |
Soriaga, Manuel P. Baricuatro, Jack Hess L |
author |
Baricuatro, Jack Hess L |
author_sort |
Baricuatro, Jack Hess L |
title |
Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC) |
title_short |
Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC) |
title_full |
Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC) |
title_fullStr |
Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC) |
title_full_unstemmed |
Electrodeposition of ultrathin Pd, Co and Bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (UHV-EC) |
title_sort |
electrodeposition of ultrathin pd, co and bi films on well-defined noble-metal electrodes: studies by ultrahigh vacuum-electrochemistry (uhv-ec) |
publisher |
Texas A&M University |
publishDate |
2006 |
url |
http://hdl.handle.net/1969.1/4291 |
work_keys_str_mv |
AT baricuatrojackhessl electrodepositionofultrathinpdcoandbifilmsonwelldefinednoblemetalelectrodesstudiesbyultrahighvacuumelectrochemistryuhvec |
_version_ |
1716503463851982848 |