| Summary: | This diploma thesis deals utilization of plasma {--} chemical reactions in technological applications, mainly at deposition of thin films and their sequential diagnostics. Introduction describes basis of theoretic aspects of plasma physics. There are discussed relations between temperature, pressure and type of discharge and physical principles of creation and preservation of plasma. Next chapter is focused on description of source of plasmatic discharges generated by microwave field, specially the surfatron. Experimental part was made just with utilization of surfatron discharge. In the last theoretic part are presented various types of reactors used in deposition of thin films and methods of diagnostics of thin films, mainly atomic force microscopy and X {--} ray diffraction. Practical part consisted of preparation and deposition of TiO2 thin films with different thickness and properties. Deposited samples were diagnosed in Institute of Physics the Academy of Science of the Czech Republic in Prague. Relations between time of deposition and films properties, example thickness and relative roughness, are the main part of discussion. In this work is described influence of thermal annealing on photo-electrics properties, too.
|
|---|
