Optimizing SCR design for optical detection
Approved for public release, distribution unlimited === r greater than 5.2 [micrometer], and the active mask was recognized as an essential augmentation to all metal contacts in devices fabricated using CMOS technology.
Main Author: | del Casal, Esperanza Paz C. |
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Other Authors: | Karunasiri, Gamani |
Published: |
Monterey, California: Naval Postgraduate School
2012
|
Online Access: | http://hdl.handle.net/10945/4723 |
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