Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process

Philosophiae Doctor - PhD === When the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectric...

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Main Author: Lebogang, Kotsedi
Other Authors: Knoesen, Dirk
Language:en
Published: 2014
Subjects:
Online Access:http://hdl.handle.net/11394/3441
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spelling ndltd-netd.ac.za-oai-union.ndltd.org-uwc-oai-etd.uwc.ac.za-11394-34412018-04-06T03:59:39Z Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process Lebogang, Kotsedi Knoesen, Dirk Madjoe, Reginaldt Hot-Wire chemical vapour deposition Aluminium Doping Hydrogenated amorphous silicon Phosphine Solar cell Photovoltaic Nanocrystalline Thin film Indium tin oxide Philosophiae Doctor - PhD When the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectrical properties of the film. The improved properties of a-Si:H makes it possible to manufacture electronic devices including a solar cell.A solar cell device based on the hydrogenated amorphous silicon (a-Si:H) was fabricated using the Hot-Wire Chemical Vapour Deposition (HWCVD). When an n-i-p solar cell configuration is grown, the norm is that the p-doped layer is deposited from a mixture of silane (SiH4) gas with diborane (B2H6). The boron atoms from diborane bonds to the silicon atoms and because of the number of the valance electrons, the grown film becomes a p-type film. Aluminium is a group 3B element and has the same valence electrons as boron, hence it will also produce a p-type film when it bonds with silicon.In this study the p-doped layer is grown from the co-deposition of a-Si:H from SiH4 with aluminium evaporation resulting in a crystallized, p-doped thin film. When this thin film is used in the n-i-p cell configuration, the device shows photo-voltaic activity.The intrinsic layer and the n-type layers for the solar cell were grown from SiH4 gas and Phosphine (PH3) gas diluted in SiH4 respectively. The individual layers of the solar cell device were characterized for both their optical and electrical properties. This was done using a variety of experimental techniques. The analyzed results from the characterization techniques showed the films to be of device quality standard. The analysed results of the ptype layer grown from aluminium showed the film to be successfully crystallized and doped.A fully functional solar cell was fabricated from these layers and the cell showed photovoltaic activity. 2014-07-02T11:41:24Z 2014-07-02T11:41:24Z 2010 Thesis http://hdl.handle.net/11394/3441 en
collection NDLTD
language en
sources NDLTD
topic Hot-Wire chemical vapour deposition
Aluminium
Doping
Hydrogenated amorphous silicon
Phosphine
Solar cell
Photovoltaic
Nanocrystalline
Thin film
Indium tin oxide
spellingShingle Hot-Wire chemical vapour deposition
Aluminium
Doping
Hydrogenated amorphous silicon
Phosphine
Solar cell
Photovoltaic
Nanocrystalline
Thin film
Indium tin oxide
Lebogang, Kotsedi
Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
description Philosophiae Doctor - PhD === When the amorphous silicon (a-Si) dangling bonds are bonded to hydrogen the concentration of the dangling bond is decreased. The resulting film is called hydrogenated amorphous silicon (a-Si:H). The reduction in the dangling bonds concentration improves the optoelectrical properties of the film. The improved properties of a-Si:H makes it possible to manufacture electronic devices including a solar cell.A solar cell device based on the hydrogenated amorphous silicon (a-Si:H) was fabricated using the Hot-Wire Chemical Vapour Deposition (HWCVD). When an n-i-p solar cell configuration is grown, the norm is that the p-doped layer is deposited from a mixture of silane (SiH4) gas with diborane (B2H6). The boron atoms from diborane bonds to the silicon atoms and because of the number of the valance electrons, the grown film becomes a p-type film. Aluminium is a group 3B element and has the same valence electrons as boron, hence it will also produce a p-type film when it bonds with silicon.In this study the p-doped layer is grown from the co-deposition of a-Si:H from SiH4 with aluminium evaporation resulting in a crystallized, p-doped thin film. When this thin film is used in the n-i-p cell configuration, the device shows photo-voltaic activity.The intrinsic layer and the n-type layers for the solar cell were grown from SiH4 gas and Phosphine (PH3) gas diluted in SiH4 respectively. The individual layers of the solar cell device were characterized for both their optical and electrical properties. This was done using a variety of experimental techniques. The analyzed results from the characterization techniques showed the films to be of device quality standard. The analysed results of the ptype layer grown from aluminium showed the film to be successfully crystallized and doped.A fully functional solar cell was fabricated from these layers and the cell showed photovoltaic activity.
author2 Knoesen, Dirk
author_facet Knoesen, Dirk
Lebogang, Kotsedi
author Lebogang, Kotsedi
author_sort Lebogang, Kotsedi
title Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
title_short Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
title_full Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
title_fullStr Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
title_full_unstemmed Fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
title_sort fabrication and characterization of a solar cell using an aluminium p-doped layer in the hot-wire chemical vapour deposition process
publishDate 2014
url http://hdl.handle.net/11394/3441
work_keys_str_mv AT lebogangkotsedi fabricationandcharacterizationofasolarcellusinganaluminiumpdopedlayerinthehotwirechemicalvapourdepositionprocess
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