Cobalt silicides formation through a diffusion barrier
Silicon (Si) has various applications in different technological fields as a structural material or a semiconductor. Cobalt disilicide is an attractive silicide for contact with Si because it has favourable properties such as low resistivity. Recently, a great deal of interest has been shown in thin...
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| Language: | en |
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University of Pretoria
2016
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| Online Access: | http://hdl.handle.net/2263/53491 Abrass, HA 2016, Cobalt silicides formation through a diffusion barrier, PhD Thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/53491> |