Cobalt silicides formation through a diffusion barrier

Cobalt silicides formation through a diffusion barrier

Silicon (Si) has various applications in different technological fields as a structural material or a semiconductor. Cobalt disilicide is an attractive silicide for contact with Si because it has favourable properties such as low resistivity. Recently, a great deal of interest has been shown in thin...

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Bibliographic Details
Main Author: Abrass, Hameda A.
Other Authors: Theron, C.C. (Chris)
Language:en
Published: University of Pretoria 2016
Subjects:
UCTD
Online Access:http://hdl.handle.net/2263/53491
Abrass, HA 2016, Cobalt silicides formation through a diffusion barrier, PhD Thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/53491>

Internet

http://hdl.handle.net/2263/53491
Abrass, HA 2016, Cobalt silicides formation through a diffusion barrier, PhD Thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/53491>

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