| Summary: | This study focuses on the characterization of InAs and InAs1-xSbx epitaxial layers by infrared reflectance and transmittance spectroscopy and Hall measurements. Reflectance measurements were performed in order to obtain the dielectric parameters and to extract from these information about the electrical properties (mobility and carrier concentration) of this important III-V material system. The transmittance measurements were used to determine the bandgap of InAsSb. Infrared reflectivity and transmittance measurements were performed in the wavelength range 200 – 2000 cm-1 on InAs and InAsSb layers grown on three types of substrates. A classical two oscillator model that takes into account both the free carriers and the lattice, was used to analyse the reflectance data using the BMDP® computer curve fitting software. The dielectric parameters and the electrical properties (carrier concentration and mobility) were extracted from the simulations. Due to the low free carrier concentration in the epitaxial structures, the plasma resonance frequency (ωp) values obtained from the simulations of reflectance spectra measured above 200 cm-1, were in the order of 20-30 cm-1. These low values were confirmed by direct measurements of ωp in reflectance spectra obtained in the range 15-200 cm-1. The simulated carrier concentration and mobility values determined optically were compared to the values determined by Hall measurements at room temperature and previously reported values by other researchers. The simulated values obtained were in reasonable agreement with the Hall values. The simulated and measured carrier concentrations obtained for InAs layers were significantly higher than the intrinsic carrier concentration for InAs at room temperature, indicating notable concentrations of donors resulting from the growth process.
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