Excited-plasma Synthesis of Fluorine- and Silicon-containing Organic Thin Films for Surface Science
本文データは平成22年度国立国会図書館の学位論文(博士)のデジタル化実施により作成された画像ファイルを基にpdf変換したものである === Kyoto University (京都大学) === 0048 === 新制・論文博士 === 博士(工学) === 乙第7686号 === 論工博第2535号 === 新制||工||859(附属図書館) === UT51-91-X136 === (主査)教授 清水 剛夫, 教授 山邊 時雄, 教授 生越 久靖 === 学位規則第4条第2項該当...
Main Author: | Sugimoto, Iwao |
---|---|
Other Authors: | 清水, 剛夫 |
Format: | Others |
Language: | English |
Published: |
Kyoto University
2013
|
Subjects: | |
Online Access: | http://hdl.handle.net/2433/168748 |
Similar Items
-
Polymerization and Polymer Properties of Silicon- and Fluorine-Containing Acetylenes
by: Tsuchihara, Kenji
Published: (2013) -
An atomic scale model of plasma-surface interactions and numerical analysis of the feature profile evolution during silicon etching in chlorine-containing plasmas
by: Osano, Yugo
Published: (2011) -
Synthetic Studies on Fluorine-containing Novel Liquid-crystalline Materials
by: Kanie, Kiyoshi
Published: (2009) -
Preparation of epitaxial oxide films on sapphire substrates by metal organic deposition
by: Yamaguchi, Iwao
Published: (2010) -
Studies on High Performance Separation of Organic Fluorine Compounds
by: Isemura, Tsuguhide
Published: (2010)