A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques

Kyoto University (京都大学) === 0048 === 新制・論文博士 === 博士(工学) === 乙第11362号 === 論工博第3764号 === 新制||工||1300(附属図書館) === UT51-2004-C110 === (主査)教授藤本孝, 教授藤田靜雄, 教授立花明知 === 学位規則第4条第2項該当

Bibliographic Details
Main Author:	Eriguchi, Koji
Other Authors:	藤本, 孝
Format:	Others
Language:	English
Published:	京都大学 (Kyoto University) 2011
Subjects:	500
Online Access:	http://hdl.handle.net/2433/148307

id	ndltd-kyoto-u.ac.jp-oai-repository.kulib.kyoto-u.ac.jp-2433-148307
record_format	oai_dc
spelling	ndltd-kyoto-u.ac.jp-oai-repository.kulib.kyoto-u.ac.jp-2433-1483072017-10-06T03:47:45Z A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques 薄膜シリコン酸化膜の劣化・破壊機構およびその評価手法に関する研究ハクマクシリコンサンカマクノレッカハカイキコウオヨビソノヒョウカシュホウニカンスルケンキュウ Eriguchi, Koji 藤本, 孝藤田, 靜雄立花, 明知江利口, 浩二エリグチ, コウジ 500 Kyoto University (京都大学) 0048 新制・論文博士博士(工学) 乙第11362号論工博第3764号新制\|\|工\|\|1300(附属図書館) UT51-2004-C110 (主査)教授藤本孝, 教授藤田靜雄, 教授立花明知学位規則第4条第2項該当 2011-10-27T05:36:27Z 2011-10-27T05:36:27Z 2004-01-23 2004-01-23 DAM Thesis or Dissertation http://hdl.handle.net/2433/148307 000007367125 eng application/pdf 京都大学 (Kyoto University) 京都大学
collection	NDLTD
language	English
format	Others
sources	NDLTD
topic	500
spellingShingle	500 Eriguchi, Koji A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
description	Kyoto University (京都大学) === 0048 === 新制・論文博士 === 博士(工学) === 乙第11362号 === 論工博第3764号 === 新制\|\|工\|\|1300(附属図書館) === UT51-2004-C110 === (主査)教授藤本孝, 教授藤田靜雄, 教授立花明知 === 学位規則第4条第2項該当
author2	藤本, 孝
author_facet	藤本, 孝 Eriguchi, Koji
author	Eriguchi, Koji
author_sort	Eriguchi, Koji
title	A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
title_short	A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
title_full	A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
title_fullStr	A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
title_full_unstemmed	A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
title_sort	study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques
publisher	京都大学 (Kyoto University)
publishDate	2011
url	http://hdl.handle.net/2433/148307
work_keys_str_mv	AT eriguchikoji astudyofwearoutandbreakdownphenomenainthinsilicondioxidefilmsandtheevaluationtechniques AT eriguchikoji báomóshirikonsuānhuàmónolièhuàpòhuàijīgòuoyobisonopíngsìshǒufǎniguānsuruyánjiū AT eriguchikoji hakumakushirikonsankamakunorekkahakaikikouoyobisonohyoukashuhounikansurukenkyuu AT eriguchikoji studyofwearoutandbreakdownphenomenainthinsilicondioxidefilmsandtheevaluationtechniques
_version_	1718547739823833088

A study of wear-out and breakdown phenomena in thin silicon dioxide films and the evaluation techniques

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