Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process
The objective of this thesis is to develop an easy-to-use and computationally economical numerical tool to investigate the flow field in the Pulsed Pressure Chemical Vapour Deposition (PP-CVD) reactor. The PP-CVD process is a novel thin film deposition technique with some advantages over traditional...
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| Language: | en |
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University of Canterbury. Mechanical Engineering
2012
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| Online Access: | http://hdl.handle.net/10092/6829 |