Multilevel Nanoengineering for Imprint Lithography
The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increasingly difficult and expensive. Extreme ultra-violet lithography is an alternate method that has the potential to provide feature sizes down to 30 nm, however, it will come at an even greater cost. Na...
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| Language: | en |
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University of Canterbury. Electrical and Computer Engineering
2008
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| Online Access: | http://hdl.handle.net/10092/1071 |