The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies

The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies

The development of p-type metal oxide materials is of great importance and is seen as an enabling factor in next-generation electronic devices. Consequently, the formulation of reliable techniques for the deposition of these materials is of significant interest, though precursor chemistry towards th...

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Main Author: Parish, James
Other Authors: Raithby, Paul ; Johnson, Andrew
Published: University of Bath 2019
Online Access:https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.767599
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spelling ndltd-bl.uk-oai-ethos.bl.uk-7675992019-03-14T03:35:30ZThe development of molecular precursors for the atomic layer deposition of tin monoxide and related studiesParish, JamesRaithby, Paul ; Johnson, Andrew2019The development of p-type metal oxide materials is of great importance and is seen as an enabling factor in next-generation electronic devices. Consequently, the formulation of reliable techniques for the deposition of these materials is of significant interest, though precursor chemistry towards these materials is sparse. This investigation aimed to develop novel chemical precursors for the atomic layer deposition of p-type tin(II) oxide, and describes a number of related studies and perspectives on the chemistry involved.University of Bathhttps://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.767599Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
description The development of p-type metal oxide materials is of great importance and is seen as an enabling factor in next-generation electronic devices. Consequently, the formulation of reliable techniques for the deposition of these materials is of significant interest, though precursor chemistry towards these materials is sparse. This investigation aimed to develop novel chemical precursors for the atomic layer deposition of p-type tin(II) oxide, and describes a number of related studies and perspectives on the chemistry involved.
author2 Raithby, Paul ; Johnson, Andrew
author_facet Raithby, Paul ; Johnson, Andrew
Parish, James
author Parish, James
spellingShingle Parish, James
The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
author_sort Parish, James
title The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
title_short The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
title_full The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
title_fullStr The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
title_full_unstemmed The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
title_sort development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
publisher University of Bath
publishDate 2019
url https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.767599
work_keys_str_mv AT parishjames thedevelopmentofmolecularprecursorsfortheatomiclayerdepositionoftinmonoxideandrelatedstudies
AT parishjames developmentofmolecularprecursorsfortheatomiclayerdepositionoftinmonoxideandrelatedstudies
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