The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition

The presence of organic ionic additives during aerosol assisted chemical vapour deposition of zinc oxide has a profound influence on the microstructure of the resulting films. Growth of crystallites can be controlled to grow a range of shapes, including irregular shaped clusters, individual hexagona...

Full description

Bibliographic Details
Main Author: Kaye, Karl
Other Authors: Hyett, Geoffrey
Published: University of Southampton 2016
Subjects:
541
Online Access:https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.690317
id ndltd-bl.uk-oai-ethos.bl.uk-690317
record_format oai_dc
spelling ndltd-bl.uk-oai-ethos.bl.uk-6903172018-09-05T03:34:54ZThe manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour depositionKaye, KarlHyett, Geoffrey2016The presence of organic ionic additives during aerosol assisted chemical vapour deposition of zinc oxide has a profound influence on the microstructure of the resulting films. Growth of crystallites can be controlled to grow a range of shapes, including irregular shaped clusters, individual hexagonal plates and stacks of plates growing perpendicular to the substrate. During testing of organic additives in the deposition of zinc oxide via aerosol assisted chemical vapour deposition, urea was found to result in the formation of zinc carbodiimide. By adjusting the parameters it was determined that a temperature of 450 °C and a molar ratio of 3:1 of urea:zinc acetate are ideal conditions to form uniform films of zinc carbodiimide. This is the first example of the formation of a thin film of zinc carbodiimide. By using a mixed solution of zinc acetate and titanium (IV) isopropoxide, it is possible to deposit mixed phase films of zinc oxide, titanium dioxide and various zinc titanate phases. Stepwise treatment of these films with dilute acid and hydrogen results in the leeching of the zinc phases. The resulting films are composed of porous titanium dioxide which exhibits greater photocatalytic activity than dense films of titanium dioxide. By using a solution of tetrakis (diethylamido) titanium in hexane or toluene, it is possible to deposit a thin film of titanium nitride onto float glass in a single step at temperatures as low as 350 °C. Introduction of ethyl acetate results in the formation of thin films comprised of phases of both titanium nitride and titanium dioxide.541University of Southamptonhttps://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.690317https://eprints.soton.ac.uk/397989/Electronic Thesis or Dissertation
collection NDLTD
sources NDLTD
topic 541
spellingShingle 541
Kaye, Karl
The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
description The presence of organic ionic additives during aerosol assisted chemical vapour deposition of zinc oxide has a profound influence on the microstructure of the resulting films. Growth of crystallites can be controlled to grow a range of shapes, including irregular shaped clusters, individual hexagonal plates and stacks of plates growing perpendicular to the substrate. During testing of organic additives in the deposition of zinc oxide via aerosol assisted chemical vapour deposition, urea was found to result in the formation of zinc carbodiimide. By adjusting the parameters it was determined that a temperature of 450 °C and a molar ratio of 3:1 of urea:zinc acetate are ideal conditions to form uniform films of zinc carbodiimide. This is the first example of the formation of a thin film of zinc carbodiimide. By using a mixed solution of zinc acetate and titanium (IV) isopropoxide, it is possible to deposit mixed phase films of zinc oxide, titanium dioxide and various zinc titanate phases. Stepwise treatment of these films with dilute acid and hydrogen results in the leeching of the zinc phases. The resulting films are composed of porous titanium dioxide which exhibits greater photocatalytic activity than dense films of titanium dioxide. By using a solution of tetrakis (diethylamido) titanium in hexane or toluene, it is possible to deposit a thin film of titanium nitride onto float glass in a single step at temperatures as low as 350 °C. Introduction of ethyl acetate results in the formation of thin films comprised of phases of both titanium nitride and titanium dioxide.
author2 Hyett, Geoffrey
author_facet Hyett, Geoffrey
Kaye, Karl
author Kaye, Karl
author_sort Kaye, Karl
title The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
title_short The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
title_full The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
title_fullStr The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
title_full_unstemmed The manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
title_sort manipulation of the microstructure of functional metal oxides using aerosol assisted chemical vapour deposition
publisher University of Southampton
publishDate 2016
url https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.690317
work_keys_str_mv AT kayekarl themanipulationofthemicrostructureoffunctionalmetaloxidesusingaerosolassistedchemicalvapourdeposition
AT kayekarl manipulationofthemicrostructureoffunctionalmetaloxidesusingaerosolassistedchemicalvapourdeposition
_version_ 1718730896599678976