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ndltd-bl.uk-oai-ethos.bl.uk-6693072015-12-31T03:18:50ZDeveloping CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technologyLi, Yifan2007University of Edinburghhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.669307http://hdl.handle.net/1842/11052Electronic Thesis or Dissertation
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NDLTD
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NDLTD
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author |
Li, Yifan
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Li, Yifan
Developing CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technology
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author_facet |
Li, Yifan
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author_sort |
Li, Yifan
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title |
Developing CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technology
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title_short |
Developing CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technology
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title_full |
Developing CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technology
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title_fullStr |
Developing CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technology
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title_full_unstemmed |
Developing CMOS compatible electro wetting-on-dielectric (EWOD) microfluidic technology
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title_sort |
developing cmos compatible electro wetting-on-dielectric (ewod) microfluidic technology
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publisher |
University of Edinburgh
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publishDate |
2007
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url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.669307
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work_keys_str_mv |
AT liyifan developingcmoscompatibleelectrowettingondielectricewodmicrofluidictechnology
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1718158070199091200
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