Critical dimension measurement and sidewall slope evaluation using a coherence probe microscope
The drive by the manufacturers and designers of integrated circuits towards smaller dimensions has led to ever increasing demands being placed on the vendors of semiconductor equipment. In the photolithography arena this has meant producing optical projection systems with improved resolution approac...
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University of Edinburgh
1994
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.649186 |