Critical dimension control : influencing factors and measurement
Advanced Lithography continues to be the limiting factor in the drive for higher levels of microcircuit integration. The key to the successful management of a lithography process is the integration of full measurement and instrumentation functions with the process, and the adoption of effective proc...
Main Author: | Binnie, Iona B. |
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Published: |
University of Edinburgh
1991
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Subjects: | |
Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.641625 |
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