Critical dimension control : influencing factors and measurement

Advanced Lithography continues to be the limiting factor in the drive for higher levels of microcircuit integration. The key to the successful management of a lithography process is the integration of full measurement and instrumentation functions with the process, and the adoption of effective proc...

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Bibliographic Details
Main Author: Binnie, Iona B.
Published: University of Edinburgh 1991
Subjects:
Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.641625

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