Investigation of the structure, magnetic and magnetoelastic properties of cobalt ferrite and its derivatives
In this research, cobalt ferrite thin films were deposited at 523 K which eliminates the need for annealing at higher temperatures and offers hope for integration of the thin films into micro-electromechanical devices.
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Cardiff University
2010
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.584801 |