Characterisation and material removal properties of the RAP™ process

The Reactive Atom Plasma® (RAP) process is a plasma chemical etching process. RAP was developed at RAPT Industries as a process for removing subsurface damage from silicon carbide optics. The process is being investigated at Cranfield University as a novel method for the fine surface correction of l...

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Main Author:	O'Brien, William John
Other Authors:	Nicholls, J. R. : Shore, Paul
Published:	Cranfield University 2011
Subjects:	530.44
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.541264

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spelling	ndltd-bl.uk-oai-ethos.bl.uk-5412642015-03-20T04:28:54ZCharacterisation and material removal properties of the RAP™ processO'Brien, William JohnNicholls, J. R. : Shore, Paul2011The Reactive Atom Plasma® (RAP) process is a plasma chemical etching process. RAP was developed at RAPT Industries as a process for removing subsurface damage from silicon carbide optics. The process is being investigated at Cranfield University as a novel method for the fine surface correction of large optics, with the aim of shortening the manufacturing period of the next generation of large telescopes. RAP offers material removal rates that are up to 10 times higher than those of ion beam figuring, the current state-of-the-art technique and the convenience in that it can be operated at atmospheric pressure. Cont/d.530.44Cranfield Universityhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.541264http://dspace.lib.cranfield.ac.uk/handle/1826/6560Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.44
spellingShingle	530.44 O'Brien, William John Characterisation and material removal properties of the RAP™ process
description	The Reactive Atom Plasma® (RAP) process is a plasma chemical etching process. RAP was developed at RAPT Industries as a process for removing subsurface damage from silicon carbide optics. The process is being investigated at Cranfield University as a novel method for the fine surface correction of large optics, with the aim of shortening the manufacturing period of the next generation of large telescopes. RAP offers material removal rates that are up to 10 times higher than those of ion beam figuring, the current state-of-the-art technique and the convenience in that it can be operated at atmospheric pressure. Cont/d.
author2	Nicholls, J. R. : Shore, Paul
author_facet	Nicholls, J. R. : Shore, Paul O'Brien, William John
author	O'Brien, William John
author_sort	O'Brien, William John
title	Characterisation and material removal properties of the RAP™ process
title_short	Characterisation and material removal properties of the RAP™ process
title_full	Characterisation and material removal properties of the RAP™ process
title_fullStr	Characterisation and material removal properties of the RAP™ process
title_full_unstemmed	Characterisation and material removal properties of the RAP™ process
title_sort	characterisation and material removal properties of the rap™ process
publisher	Cranfield University
publishDate	2011
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.541264
work_keys_str_mv	AT obrienwilliamjohn characterisationandmaterialremovalpropertiesoftherapprocess
_version_	1716785328426057728

Characterisation and material removal properties of the RAP™ process

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