The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods
A novel TCVD procedure was employed for the preparation for the preparation of supported gold catalysts using dimethyl gold acetylacetonates Me2Au(acac) as the volatile precursor. Preliminary experiments on the use of TCVD for the preparation of copper catalysts from copper acetylacetonate Cu(acac)...
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2008
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ndltd-bl.uk-oai-ethos.bl.uk-4901622015-03-20T05:04:15ZThe growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methodsHussain, Sayyed Zafar2008A novel TCVD procedure was employed for the preparation for the preparation of supported gold catalysts using dimethyl gold acetylacetonates Me2Au(acac) as the volatile precursor. Preliminary experiments on the use of TCVD for the preparation of copper catalysts from copper acetylacetonate Cu(acac) were also performed. The reactor design and the preparation protocol employed were used for the first time during current investigation. The impact of calcination conditions, system vacuum along with different pre-treatments have been reported for better understanding of TCVD procedure.671.735University of Salfordhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.490162Electronic Thesis or Dissertation |
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671.735 |
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671.735 Hussain, Sayyed Zafar The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
description |
A novel TCVD procedure was employed for the preparation for the preparation of supported gold catalysts using dimethyl gold acetylacetonates Me2Au(acac) as the volatile precursor. Preliminary experiments on the use of TCVD for the preparation of copper catalysts from copper acetylacetonate Cu(acac) were also performed. The reactor design and the preparation protocol employed were used for the first time during current investigation. The impact of calcination conditions, system vacuum along with different pre-treatments have been reported for better understanding of TCVD procedure. |
author |
Hussain, Sayyed Zafar |
author_facet |
Hussain, Sayyed Zafar |
author_sort |
Hussain, Sayyed Zafar |
title |
The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
title_short |
The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
title_full |
The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
title_fullStr |
The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
title_full_unstemmed |
The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
title_sort |
growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods |
publisher |
University of Salford |
publishDate |
2008 |
url |
http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.490162 |
work_keys_str_mv |
AT hussainsayyedzafar thegrowthandcharacterisationofsupportedmetalcatalystspreparedbynovelchemicalvapourdepositionmethods AT hussainsayyedzafar growthandcharacterisationofsupportedmetalcatalystspreparedbynovelchemicalvapourdepositionmethods |
_version_ |
1716788249132793856 |