Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system

Bibliographic Details
Main Author:	Coutts, T. J.
Published:	Open University 1968
Subjects:	530.4
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.452368

id	ndltd-bl.uk-oai-ethos.bl.uk-452368
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-4523682016-08-04T04:20:51ZSome measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum systemCoutts, T. J.1968530.4Open Universityhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.452368Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	530.4
spellingShingle	530.4 Coutts, T. J. Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
author	Coutts, T. J.
author_facet	Coutts, T. J.
author_sort	Coutts, T. J.
title	Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
title_short	Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
title_full	Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
title_fullStr	Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
title_full_unstemmed	Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
title_sort	some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system
publisher	Open University
publishDate	1968
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.452368
work_keys_str_mv	AT couttstj somemeasurementsoftheelectricalresistanceofthincopperfilmsdepositedinanultrahighvacuumsystem
_version_	1718373335990009856

Some measurements of the electrical resistance of thin copper films deposited in an ultra-high vacuum system

Similar Items