Suppression of boron transient enhanced and thermal diffusion in silicon and silicon germanium by fluorine implantation

Suppression of boron transient enhanced and thermal diffusion in silicon and silicon germanium by fluorine implantation

Bibliographic Details
Main Author:	El Mubarek, Huda Abdel Wahab Abdel Rahim
Published:	University of Southampton 2004
Subjects:	621.38152
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.419196

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