Surface segregation of As during the epitaxial growth of Si

Bibliographic Details
Main Author:	Hartell, Antony Douglas
Published:	Imperial College London 2003
Subjects:	546.683
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.405268

id	ndltd-bl.uk-oai-ethos.bl.uk-405268
record_format	oai_dc
spelling	ndltd-bl.uk-oai-ethos.bl.uk-4052682015-03-19T10:03:30ZSurface segregation of As during the epitaxial growth of SiHartell, Antony Douglas2003546.683Imperial College Londonhttp://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.405268Electronic Thesis or Dissertation
collection	NDLTD
sources	NDLTD
topic	546.683
spellingShingle	546.683 Hartell, Antony Douglas Surface segregation of As during the epitaxial growth of Si
author	Hartell, Antony Douglas
author_facet	Hartell, Antony Douglas
author_sort	Hartell, Antony Douglas
title	Surface segregation of As during the epitaxial growth of Si
title_short	Surface segregation of As during the epitaxial growth of Si
title_full	Surface segregation of As during the epitaxial growth of Si
title_fullStr	Surface segregation of As during the epitaxial growth of Si
title_full_unstemmed	Surface segregation of As during the epitaxial growth of Si
title_sort	surface segregation of as during the epitaxial growth of si
publisher	Imperial College London
publishDate	2003
url	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.405268
work_keys_str_mv	AT hartellantonydouglas surfacesegregationofasduringtheepitaxialgrowthofsi
_version_	1716772878349762560

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