SIMS depth profiling of ultra-low energy ion implanted silicon using sub-keV ion beams

SIMS depth profiling of ultra-low energy ion implanted silicon using sub-keV ion beams

Bibliographic Details
Main Author:	Bellingham, Julie
Published:	University of Warwick 2003
Subjects:	537.6226
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.397280

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