A study of the cause of residual stresses in sputtered films

A study of the cause of residual stresses in sputtered films

Bibliographic Details
Main Author:	Hudson, Craig
Published:	University of Cambridge 1995
Subjects:	530.41 Solid-state physics
Online Access:	http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.387735

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